Back to results
US 12,617,692 B2Granted
Film-forming material
AssigneeMitsui Kinzoku Company, Limited
InventorsRyuichi Sato, Naoki Fukagawa, Yuji Shigeyoshi, Kento Matsukura
Life of this patent
Estimating the term…
Abstract
A film-forming material of the present invention contains an oxyfluoride of yttrium represented by YOXFY (X and Y are numbers satisfying 0<X and X<Y) and YF3, wherein a ratio I2/I1 of a peak height I2 of the (020) plane of YF3 to a peak height I1 of the main peak of YOXFY as analyzed by XRD is from 0.005 to 100. It is preferable that a ratio I4/I1 of a peak height I4 of the main peak of Y2O3 to the peak height I1 of the main peak of YOXFY as analyzed by XRD is 0.01 or less.
Claims14
A film-forming material in powder form comprising:
- an yttrium oxyfluoride represented by YO0.8F1.4 and YF3,
- wherein a ratio I2/I1 of a peak height I2 of the (020) plane of the YF3 to a height I1 of a main peak of the YO0.8F1.4 as analyzed by XRD is from 0.19 to 3,
- and the average particle size D50 of the film-forming material in powder form is 0.1 μm to 9 μm, and an oxygen content in the film-forming material in powder form is from 0.5 to 11.0 mass %.
Dependencies are inferred from the claim text.