Process for preparing electroactive materials for metal-ion batteries
AssigneeNexeon Limited
InventorsJose Medrano Catalan, Markus Andersson
Life of this patent
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Abstract
The invention relates to a process for preparing composite particles, the process comprising contacting the plurality of particles in the reaction zone with a gas comprising at least 25 vol % of a silicon-containing precursor at a temperature effective to cause deposition of silicon in the pores of the porous particles. A controlled temperature differential between the maximum temperature of the internal surfaces of the reaction zone and the simultaneous minimum temperature within the plurality of porous particles is maintained during the contacting step.
Claims25
A process for preparing composite particles, the process comprising the steps of:
- (a) providing a plurality of porous particles in a reaction zone, the reaction zone having internal surfaces;
- and
- (b) contacting the plurality of particles in the reaction zone with a gas comprising at least 25 vol % of a silicon-containing precursor at a temperature effective to cause deposition of silicon in the pores of the porous particles;
- wherein ΔT≤+90° C. is maintained during step (b), wherein ΔT represents the temperature differential between the maximum temperature of the internal surfaces of the reaction zone and the simultaneous minimum temperature within the plurality of porous particles, wherein a positive value of ΔT indicates that the maximum temperature of the internal surfaces of the reaction zone is higher than the minimum temperature within the plurality of particles;
- and
- wherein step (b) comprises continuously agitating the porous particles during said contacting.
A process for preparing composite particles, the process comprising the steps of:
- (a) providing a plurality of porous particles in a reaction zone, the reaction zone having internal surfaces;
- and
- (b) contacting the plurality of particles in the reaction zone with a gas comprising at least 25 vol % of a silicon-containing precursor at a temperature effective to cause deposition of silicon in the pores of the porous particles;
- wherein ΔT≤+40° C. is maintained during step (b), wherein ΔT represents the temperature differential between the maximum temperature of the internal surfaces of the reaction zone and the simultaneous minimum temperature within the plurality of porous particles, wherein a positive value of ΔT indicates that the maximum temperature of the internal surfaces of the reaction zone is higher than the minimum temperature within the plurality of particles;
- and
- wherein the minimum temperature within the plurality of porous particles during said contacting in step (b) is in the range from 360 to 395° C.
Dependencies are inferred from the claim text.