Substrate transport method and substrate processing system

A substrate transport method for a substrate processing system including a plurality of processing chambers, a load lock chamber, a vacuum transport device provided in a vacuum transport chamber connecting the load lock chamber and the plurality of processing chambers and configured to simultaneously transport a plurality of substrates, and an atmospheric transport device provided in an atmospheric transport chamber and configured to transport a substrate from a carrier to the load lock chamber, the substrate transport method comprising:

• acquiring in advance a relative positional error between a center position of one substrate placed on a first stage in one processing chamber among the plurality of processing chambers with respect to a center position of the first stage in the one processing chamber for a case where the plurality of substrates are transported from the load lock chamber to the plurality of processing chambers and placed on respective first stages in the plurality of processing chambers;
• and
• placing the plurality of substrates on respective second stages in the load lock chamber, based on a transport path of the plurality of substrates and the relative positional error.