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US 12,615,968 B2Granted
Protective sealant for chalcogenide material and methods for forming the same
AssigneeMicron Technology, Inc.
InventorsFarrell M. Good, Robert K. Grubbs, Gurpreet S. Lugani
Life of this patent
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Abstract
Techniques are described to form a liner to protect a material, such as a storage element material, from damage during subsequent operations or phases of a manufacturing process. The liner may be bonded to the material (e.g., a chalcogenide material) using a strong bond or a weak bond. In some cases, a sealant material may be deposited during an etching phase of the manufacturing process to prevent subsequent etching operations from damaging a material that has just been etched.
Claims14
An apparatus, comprising:
- a first pillar comprising a first electrode, a chalcogenide material for storing information coupled with the first electrode, and a second electrode coupled with the chalcogenide material;
- a first liner in physical contact with a sidewall of the chalcogenide material and extending between the first electrode and the second electrode;
- and
- a second liner in physical contact with the first liner, the first electrode, and the second electrode of the first pillar, the second liner being a different material than the first liner.
1 more element
Dependencies are inferred from the claim text.