Integrated circuit including standard cells, and method of designing the integrated circuit

An integrated circuit comprising standard cells placed on a plurality of rows extending in a first horizontal direction, the integrated circuit comprising:

• a first standard cell placed on a row having a first height in a second horizontal direction perpendicular to the first horizontal direction;
• a second standard cell continuously placed on two or more rows, each of the two or more rows having the first height;
• a third standard cell continuously placed on a row having the first height in the second horizontal direction and a row having a second height in the second horizontal direction, the second height being different from the first height;
• a fourth standard cell placed on a row having the first height;
• a plurality of first power lines formed on boundaries of a first subset of the plurality of rows and configured to supply a first supply voltage to the standard cells;
• and
• a plurality of second power lines formed on boundaries of a second subset of the plurality of rows and configured to supply a second supply voltage to the standard cells,
• wherein the first standard cell, the second standard cell, the third standard cell, and the fourth standard cell perform an identical function,
• wherein the first standard cell includes first conductive patterns, the second standard cell includes second conductive patterns, the third standard cell includes third conductive patterns, and the fourth standard cell includes fourth conductive patterns,
• wherein the first conductive patterns, the second conductive patterns, the third conductive patterns, and the fourth conductive patterns are formed in the same metal layer,
• wherein the first conductive patterns included in the first standard cell are arranged differently from the fourth conductive patterns included in the fourth standard cell, and
• wherein, of the plurality of first power lines and the plurality of second power lines, a placement sequence in the second horizontal direction of a first set of power lines including at least one first power line and at least one second power line supplying a voltage to the first standard cell is different from a placement sequence in the second horizontal direction of a second set of power lines including at least one first power line and at least one second power line supplying a voltage to the fourth standard cell.

An integrated circuit comprising standard cells placed on a plurality of rows extending in a first horizontal direction, the integrated circuit comprising:

• a first standard cell placed on two or more rows, each of the two or more rows having a first height in a second horizontal direction perpendicular to the first horizontal direction;
• a second standard cell placed on two or more rows each of which having the first height in the second horizontal direction;
• a plurality of first power lines formed on boundaries of a first subset of the plurality of rows and configured to supply a first supply voltage to the standard cells;
• and
• a plurality of second power lines formed on boundaries of a second subset of the plurality of rows and configured to supply a second supply voltage to the standard cells,
• wherein the first standard cell and the second standard cell perform an identical function and have an identical height,
• wherein, of the plurality of first power lines and the plurality of second power lines, a placement sequence in the second horizontal direction of a first set of power lines including at least one first power line and at least one second power line supplying a voltage to the first standard cell is different from a placement sequence in the second horizontal direction of a second set of power lines including at least one first power line and at least one second power line supplying a voltage to the second standard cell,
• wherein the first standard cell includes first conductive patterns and the second standard cell includes second conductive patterns,
• wherein the first conductive patterns and the second conductive patterns are formed in the same metal layer, and
• wherein the first conductive patterns included in the first standard cell are arranged differently from the second conductive patterns included in the second standard cell.