Semiconductor device and method for manufacturing the same
AssigneeDynax Semiconductor, Inc.
InventorsXi Song, Pengyu Han, Huiqin Wang
Life of this patent
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AssigneeDynax Semiconductor, Inc.
InventorsXi Song, Pengyu Han, Huiqin Wang
Estimating the term…
Embodiments of the present disclosure disclose a semiconductor device and a method for manufacturing the same. The semiconductor device includes an active region and a passive region, the semiconductor device further includes a source, a gate and a drain located on one side of a substrate, the gate being located between the source and the drain, the gate includes a first end portion and an intermediate portion, the intermediate portion, the source and the drain all being located in the active region, and the first end portion being located in the passive region, the first end portion includes a first sub end portion and a second sub end portion. In a first direction, an extension width of the first sub end portion is greater than that of the intermediate portion, and an extension width of the second sub end portion is greater than that of the first sub end portion.
A semiconductor device comprising an active region and a passive region surrounding the active region, the semiconductor device further comprising:
Dependencies are inferred from the claim text.