Magnetron with controller for monitoring and control
AssigneeSoleras Advanced Coatings BV
InventorsWilmert De Bosscher, Ivan Van De Putte, Niek Dewilde
Life of this patent
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Abstract
A magnetron structure is described for use in a sputtering apparatus. The magnetron structure comprises a magnetron and a controller rigidly connected to the magnetron. The controller is adapted for at least partly controlling a condition and/or a functioning of the sputtering unit.
Claims19
A magnetron structure for use in a sputtering apparatus that comprises, when in operation, a vacuum part and an exterior non-vacuum part, the magnetron structure comprising:
- a magnetron,
- a sensor for sensing sensor signals related to the sputtering apparatus or a sputtering process, and
- a controller rigidly connected to the magnetron, the controller comprising a data processor being adapted for receiving and processing the sensor signals from the sensor and being configured for processing the sensor signals into data for monitoring or controlling a status of the sputtering apparatus or components thereof or a status of the sputtering process;
- wherein parts removable with a target are distinct from the magnetron structure, the controller being rigidly connected to the magnetron directly, the data processor thus, when in operation, being in the vacuum part of the sputtering apparatus.
A magnetron structure for use in a sputtering apparatus that comprises, when in operation, a vacuum part and an exterior non-vacuum part, the magnetron structure comprising:
- a magnetron,
- a sensor for sensing sensor signals related to the sputtering apparatus or a sputtering process, and
- a controller rigidly connected to the magnetron, the controller comprising a data processor being adapted for receiving and processing the sensor signals from the sensor and being configured for processing the sensor signals into data for monitoring or controlling a status of the sputtering apparatus or components thereof or a status of the sputtering process;
- wherein parts removable with a target are distinct from the magnetron structure, the controller being rigidly connected to the magnetron directly, the data processor thus, when in operation, being in the vacuum part of the sputtering apparatus,
- wherein the controller further comprises data storage for storing data over time related to the at least partly monitoring and/or controlling of a condition and/or a functioning of the sputtering apparatus.
Dependencies are inferred from the claim text.