Plasma source and plasma processing apparatus

A plasma source comprising:

• a housing that defines a plasma generation space;
• a gas inlet disposed at the housing and configured to introduce a gas;
• a power supply part disposed at the housing and configured to supply a radio frequency (RF) power;
• a supply port disposed at the housing and configured to supply active species of plasma produced from the gas in the plasma generation space;
• a dielectric plate that is disposed at the housing, transmits the RF power from the power supply part to the plasma generation space, and has an opening at a center thereof;
• a slot formed between the power supply part and the dielectric plate and through which the RF power propagates;
• and
• a gas supply line disposed at the housing, and having one end connected to the gas inlet and the other end from which a gas is supplied to the opening,
• wherein the gas supply line and the slot are separated in the housing, and
• the slot has a deficit portion where the slot is not formed when viewed from above, and the gas supply line is formed at the deficit portion.