PECVD coating system and coating method
AssigneeJiangsu Favored Nanotechnology Co., Ltd.
InventorJian Zong
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Abstract
Provided in the present disclosure are a PECVD coating system and coating method. In the coating method, deposition is performed on a surface of a substrate by means of a PECVD coating device so as to form an organic hydrophobic membrane, and deposition and coating involve the steps of: (A) providing an inductively coupled electric field for a reaction cavity of the PECVD coating device by means of an ICP generator of the PECVD coating device, so as to form a coupled magnetic field; and (B) providing a bias electric field for the reaction cavity by means of a bias power supply of the PECVD coating device.
Claims19
A coating method for forming an organic hydrophobic coating on a surface of a substrate by depositing through a plasma enhanced chemical vapor deposition (PECVD) coating equipment, comprising:
- (A) providing an inductively coupled electric field to a reaction chamber of the PECVD coating equipment through an inductive coupling plasma (ICP) generator of the PECVD coating equipment, so as to form a coupled magnetic field;
- and
- (B) providing a bias electric field to the reaction chamber through a bias power supply of the PECVD coating equipment,
- wherein the ICP generator comprises a mounting frame, an isolation plate, a housing, and a discharge assembly for providing the inductively coupled electric field to the reaction cavity, the discharge assembly comprises a set of induction coils, the set of induction coils comprises at least two induction coils in planar spiral structures, electrically connected in series and arranged to reduce an electrostatic coupling effect between the coils and plasma, and
- wherein the mounting frame has a window, the isolation plate is installed on the window, with the surrounding side being sealed, the mounting frame is installed to the reaction chamber and provided to enclose a discharge port of the reaction chamber, the discharge assembly is provided on an outer side of the isolation plate, and the housing is provided on an outer side of the discharge assembly to cover the discharge assembly, and
- wherein in step (A), the ICP generator is located on the inner side of the reaction chamber, and during operation of the ICP generator, the inductively coupled electric field generated by the ICP generator passes through the discharge port of the reaction chamber from inside to outside, to enter a reaction cavity of the reaction chamber.
A coating method for forming an organic hydrophobic coating on a surface of a substrate by depositing through a plasma enhanced chemical vapor deposition (PECVD) coating equipment, comprising:
- (A) providing an inductively coupled electric field to a reaction chamber of the PECVD coating equipment through an inductive coupling plasma (ICP) generator of the PECVD coating equipment, so as to form a coupled magnetic field;
- and
- (B) providing a bias electric field to the reaction chamber through a bias power supply of the PECVD coating equipment,
- wherein the ICP generator comprises a mounting frame, an isolation plate, a housing, and a discharge assembly for providing the inductively coupled electric field to the reaction cavity, the discharge assembly comprises a set of induction coils, the set of induction coils comprises at least two induction coils in planar spiral structures, electrically connected in series and arranged to reduce an electrostatic coupling effect between the coils and plasma, and
- wherein the mounting frame has a window, the isolation plate is installed on the window, with the surrounding side being sealed, the mounting frame is installed to the reaction chamber and provided to enclose a discharge port of the reaction chamber, the discharge assembly is provided on an outer side of the isolation plate, and the housing is provided on an outer side of the discharge assembly to cover the discharge assembly, and
- wherein in step (B), a positive electrode of the bias power supply is electrically connected to the reaction chamber, a negative electrode of the bias power supply is electrically connected to a carrier in the reaction chamber, and the reaction chamber is grounded;
- electrical connection to the bias power supply is maintained by means of an electrode connector of the carrier;
- and a spring of a mounting fixed seat presses against a bottom plate of the carrier, to maintain contact between the electrode connector and the bias power supply.
A coating method for forming an organic hydrophobic coating on a surface of a substrate by depositing through a plasma enhanced chemical vapor deposition (PECVD) coating equipment, comprising:
- (A) providing an inductively coupled electric field to a reaction chamber of the PECVD coating equipment through an inductive coupling plasma (ICP) generator of the PECVD coating equipment, so as to form a coupled magnetic field;
- and
- (B) providing a bias electric field to the reaction chamber through a bias power supply of the PECVD coating equipment,
- wherein the ICP generator comprises a mounting frame, an isolation plate, a housing, and a discharge assembly for providing the inductively coupled electric field to the reaction cavity, the discharge assembly comprises a set of induction coils, the set of induction coils comprises at least two induction coils in planar spiral structures, electrically connected in series and arranged to reduce an electrostatic coupling effect between the coils and plasma, and
- wherein the mounting frame has a window, the isolation plate is installed on the window, with the surrounding side being sealed, the mounting frame is installed to the reaction chamber and provided to enclose a discharge port of the reaction chamber, the discharge assembly is provided on an outer side of the isolation plate, and the housing is provided on an outer side of the discharge assembly to cover the discharge assembly, and
- wherein step (A) comprises opening or closing a cover of the reaction chamber by a lifting frame.
Dependencies are inferred from the claim text.