Photoexcitation method

A method of photoexcitation of a composite negative photoresist, consisting essentially of:

• providing a translatable substrate having a composite negative photoresist thereon, the composite negative photoresist comprising at least a first material and a second material, but not including a photo acid generator, photo radical generator, or photo base generator, wherein;
• the first material has at least a first energy level, a second energy level, and at least one interceding energy level between the first and second energy levels;
• and
• the second material has at least a first energy level and a second energy level, wherein the second material is polymerized when at least one electron is excited into the second energy level of the second material, wherein an energy gap between the first energy level and the at least one interceding energy level of the first material is less than the energy gap between the first and second energy level of the second material, and wherein the first material and second material are sufficiently close to one another to facilitate transfer of at least one electron;
• and
• exposing predetermined areas of the composite to a beam of photons emitted from a continuous wave diode laser by focusing the beam of photons on the composite with an objective lens, wherein the beam has a central energy flux, wherein the central energy flux is sufficient to:
• excite at least one electron from the first energy level of the first material to the at least one interceding energy level;
• excite the at least one electron from the at least one interceding energy level to the second energy level of the first material;
• and
• transfer the at least one electron from the second energy level of the first material to the second energy level of the second material to cause polymerization of the second material at the predetermined areas;
• wherein said photons have an energy lower than the energy gap between the first and second energy level of the second material;
• and wherein the exposing step is performed while continuously translating the translatable substrate, so as to form a photolithographic pattern on the substrate.