US 12,613,472 B2 · Process window based on a failure rate model

Abstract

A method for determining a process window of a patterning process based on a failure rate. The method includes obtaining a plurality of features printed on a substrate, grouping, based on a metric, the features into a plurality of groups, and generating, based on measurement data associated with a group of features, a base failure rate model for the group of features, wherein the base failure rate model identifies the process window related to the failure rate of the group of features. The method can further include generating, using the base failure rate model, a feature-specific failure rate model for a specific feature, wherein the feature-specific failure rate model identifies a feature-specific process window such that an estimated failure rate of the specific feature is below a specified threshold.

Claims20

Dependent claims

A non-transitory computer-readable medium having instructions that, when executed by a computer system, are configured to cause the computer system to at least:

obtain measurement data of a plurality of features printed on a substrate, the measurement data comprising tens of thousands or more data points;
generate, based on the measurement data associated with a group of features that are different, a base failure rate model for the group of features, wherein the base failure rate model is configured to identify a process window according to a failure rate of the group of features;
and
use the base failure rate model and characteristic data of a specific feature to generate a feature-specific failure rate model for the specific feature, wherein the feature-specific failure rate model identifies a feature-specific process window such that an estimated failure rate of the specific feature is below a specified threshold.

1 more element

A method comprising:

obtaining measurement data of a plurality of features printed on a substrate, the measurement data comprising tens of thousands or more data points;
generating, by a hardware computer system and based on the measurement data associated with a group of features that are different, a base failure rate model for the group of features, wherein the base failure rate model is configured to identify a process window according to a failure rate of the group of features;
and
using, by the hardware computer system, the base failure rate model and characteristic data of a specific feature to generate a feature-specific failure rate model for the specific feature, wherein the feature-specific failure rate model identifies a feature-specific process window such that an estimated failure rate of the specific feature is below a specified threshold.

1 more element

Dependencies are inferred from the claim text.

Process window based on a failure rate model

Life of this patent

Process window based on a failure rate model

Life of this patent

Abstract

Claims20