X-ray fluorescence analyzer
AssigneeShimadzu Corporation
InventorYuji Morihisa
Life of this patent
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Abstract
An X-ray fluorescence analyzer has a sample stage with a pass-through surface, an X-ray source for emitting primary X-rays so that the optical axis of the primary X-rays intersects with the pass-through surface obliquely, and a detector for detecting fluorescent X-rays emitted from the sample as a result of irradiation of the primary X-rays to the sample. The optical axis passes through the pass-through surface at a position closer to the X-ray source than the midpoint of the line segment connecting both ends of the pass-through surface along the optical axis.
Claims8
An X-ray fluorescence analyzer for analyzing a sample, comprising:
- a sample stage provided with a pass-through surface through which primary X-rays pass;
- an X-ray source configured to emit the primary X-rays such that an optical axis of the primary X-rays intersects with the pass-through surface obliquely;
- and
- a detector configured to detect fluorescent X-rays emitted from the sample when the sample arranged to cover the pass-through surface is irradiated with the primary X-rays,
- wherein the optical axis passes through the pass-through surface at a position closer to the X-ray source than a midpoint of a line segment connecting both ends of the pass-through surface along the optical axis, when the sample stage is viewed in plan view.
An X-ray fluorescence analyzer for analyzing a sample, comprising:
- a sample stage provided with a pass-through surface through which primary X-rays pass;
- an X-ray source configured to emit the primary X-rays such that an optical axis of the primary X-rays intersects with the pass-through surface obliquely;
- a detector configured to detect fluorescent X-rays emitted from the sample when the sample arranged to cover the pass-through surface is irradiated with the primary X-rays;
- and
- an adjustment member provided between the X-ray source and the pass-through surface, the adjustment member having an aperture to adjust a size of a beam of the primary X-rays,
- wherein in a case of assuming a line segment connecting both ends of the pass-through surface along the optical axis when the sample stage is viewed in plan view,
- when viewed along a direction of the optical axis, a size of the aperture is greater in a first direction orthogonal to the line segment in the pass-through surface than in a second direction orthogonal to both the first direction and the pass-through surface.
Dependencies are inferred from the claim text.