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US 12,612,700 B2Granted
Articles coated with a fluoro-annealed film
AssigneeEntegris, Inc.
InventorsI-Kuan Lin, Carlo Waldfried, Jianan Hou
Life of this patent
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Abstract
Articles and methods relating to coatings having superior chemical resistance and structural integrity, can be prepared via atomic layer deposition and fluoro-annealing at low process temperatures of between about 150° C. and less than 300° C. The film comprises a fluorinated metal oxide containing yttrium.
Claims5
An article, comprising:
- a substrate;
- a protective film overlying at least a portion of the substrate, the film comprising a fluorinated metal oxide containing yttrium and having a thickness of between 0.001 microns and 0.01 microns, wherein the protective film is crack resistant and pinhole free.
A method comprising:
- atomic layer depositing a metal oxide containing yttrium onto a substrate, the metal oxide forming a film with a thickness of between 0.001 microns and 0.01 microns overlying the substrate;
- and subsequently, fluoro-annealing the film at a temperature ranging from 150° C. to 275° C. in a fluorine containing environment, wherein the protective film is crack resistant and pinhole free.
Dependencies are inferred from the claim text.