Treatment liquid for semiconductor wafers, which contains hypochlorite ions
AssigneeTokuyama Corporation
InventorsTakafumi Shimoda, Takayuki Negishi, Yuki Kikkawa, Seiji Tono
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Abstract
A treatment liquid for cleaning a semiconductor wafer is a treatment liquid containing (A) a hypochlorite ion and (C) a solvent, in which pH at 25° C. is more than 7 and less than 12.0. A method for removing ruthenium and tungsten from a semiconductor wafer and cleaning the semiconductor wafer includes bringing the treatment liquid into contact with the semiconductor wafer containing ruthenium or tungsten is provided.
Claims10
A treatment liquid for cleaning a semiconductor wafer having at least one metal selected from the group consisting of ruthenium and tungsten on a surface thereof, and the liquid consisting essentially of:
- (A) a hypochlorite ion;
- (B) a counter cation comprising an alkyl ammonium ion;
- and
- (C) water,
- wherein a concentration of the (A) hypochlorite ion is 0.05 mass % to 1.45 mass %.
A treatment liquid for cleaning a semiconductor wafer having ruthenium or tungsten on a surface thereof, the liquid consisting essentially of:
- (A) a 0.05 mass % to 1.45 mass % hypochlorite ion;
- (B) 0.15 to 8 mass % of a tetramethylammonium ion;
- and
- (C) water, wherein a concentration of water is the remaining part other than (A), (B), and other additives.
Dependencies are inferred from the claim text.