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US 12,611,480 B2Granted
Hydrophilic compound removal method and odor removal method
AssigneeDaikin Industries, Ltd.
InventorsMasayuki Tsuji, Taku Yamanaka
Life of this patent
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Abstract
The disclosure provides a method for removing a C4-C20 hydrophilic compound. The method for removing a hydrophilic compound includes step (a) of exposing a composition containing a C4-C20 hydrophilic compound to 0.1 to 500 kGy of radiation to remove the hydrophilic compound.
Claims2
A method for removing a hydrophilic compound comprising:
- step (a) of exposing a composition containing perfluorooctanoic acid and salts thereof (PFOA) to 1.0 to 15 kGy of radiation in the air at room temperature, thereby removing the PFOA from the composition,
- wherein the composition is a polytetrafluoroethylene (PTFE) powder or pellet containing the PFOA,
- the PFOA content of the composition before exposure to said radiation in the step (a) is more than 1 ppm to 1% by mass, and
- the PFOA content of the composition after exposure to said radiation in the step (a) is less than 25 ppb by mass.
1 more element
Dependencies are inferred from the claim text.