Semiconductor manufacturing apparatus and manufacturing method for semiconductor device
AssigneeTokyo Electron Limited
InventorsTaro Ikeda, Satoru Kawakami, Hiroyuki Miyashita
Life of this patent
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Abstract
A semiconductor manufacturing apparatus includes: a processing container that accommodates a substrate holder that holds a plurality of substrates in a shelf shape; a gas supply that supplies a processing gas into the processing container; and a microwave introducer that generates a plasma from the processing gas. The microwave introducer includes: a rectangular waveguide provided along a length direction of the processing container and including a plurality of slots that radiates microwaves; and a phase controller that is provided at an end of the rectangular waveguide and controls a phase of the microwaves propagating in the rectangular waveguide.
Claims14
A semiconductor manufacturing apparatus comprising:
- a processing container configured to accommodate a substrate holder that holds a plurality of substrates in a shelf shape;
- a gas supply configured to supply a processing gas into the processing container;
- and
- a microwave introducer configured to generate a plasma from the processing gas,
- wherein the microwave introducer includes:
- a rectangular waveguide provided along a length direction of the processing container and including a plurality of slots that radiates microwaves;
- a microwave generator connected to one end of the rectangular waveguide and configured to supply the microwaves to the rectangular waveguide;
- and
- a phase controller connected to another end of the rectangular waveguide, bent from the another end of the rectangular waveguide, extending along the length direction of the processing container in parallel with the rectangular waveguide, and configured to control a phase of the microwaves propagating in the rectangular waveguide.
A method for manufacturing a semiconductor device, the method comprising:
- accommodating a substrate holder that holds a plurality of substrates in a shelf shape in a processing container;
- supplying a processing gas into the processing container;
- and
- generating a plasma from the processing gas by introducing microwaves from a microwave generator into the processing container,
- wherein the generating the plasma includes controlling a phase of the microwaves propagating in a rectangular waveguide having one end connected to the microwave generator by a phase controller connected to another end of the rectangular waveguide provided along a length direction of the processing container and including a plurality of slots that radiates the microwaves, and
- the phase controller is bent from the another end of the rectangular waveguide and extends along the length direction of the processing container in parallel with the rectangular waveguide.
Dependencies are inferred from the claim text.