Extreme ultraviolet source cleaning apparatus, EUV source cleaning method using the same, and substrate processing method including the same

A substrate processing method, comprising cleaning an extreme ultraviolet (EUV) source,

• wherein the cleaning the EUV source comprising:
• spraying a cleaning solution on an inner surface of a housing of the EUV source;
• cleaning the inner surface of the housing;
• and
• aspirating a material produced from the cleaning of the inner surface of the housing,
• wherein the housing includes an internal space defined by the inner surface of the housing,
• wherein the internal space becomes narrower in a first direction,
• wherein the cleaning solution includes sodium hydroxide (NaOH), and
• wherein the cleaning of the inner surface of the housing includes using a scraper to scrape the inner surface of the housing and applying electric power to the scraper.

A substrate processing method, comprising:

• loading a substrate into an exposure apparatus;
• using the exposure apparatus to process the substrate;
• unloading the substrate from the exposure apparatus;
• and
• cleaning an extreme ultraviolet (EUV) source of the exposure apparatus,
• wherein the exposure apparatus includes:
• the EUV source;
• an optical reflector that reflects EUV radiation generated from the EUV source;
• and
• a substrate stage that supports the substrate,
• wherein the cleaning the EUV source includes:
• spraying sodium hydroxide (NaOH) on an inner surface of a housing of the EUV source;
• and
• cleaning the inner surface of the housing, and
• wherein the cleaning of the inner surface of the housing includes using a scraper to scrape the inner surface of the housing and applying electric power to the scraper.