Exposure apparatus

An exposure apparatus, comprising:

• a light-emission unit that emits exposure light;
• a mask stage that holds an exposure mask;
• a workpiece stage that holds a workpiece;
• a projection optical system that irradiates the workpiece held by the workpiece stage with the exposure light, the exposure light being emitted from the light-emission unit and passing through the exposure mask;
• a lens barrel that holds the projection optical system and is directly connected to the mask stage;
• a relative-position changing mechanism that changes at least one of a relative position or a relative angle of the exposure mask relative to the lens barrel;
• and
• a sensor mechanism includes one or more detection sensors that are capable of detecting at least one of a position or an angle of an object to be detected, the sensor mechanism detecting at least one of the relative position or the relative angle of the exposure mask relative to the lens barrel, the at least one of the relative position or the relative angle being changed by the relative-position changing mechanism.