Metrology methods and apparatuses for lithographic performance parameter evaluation using probability descriptions

A method of determining a stochastic performance parameter, the stochastic performance parameter being associated with a relative position of at least two structure features relating to one or more structures on a substrate resulting from a lithographic process, the method comprising:

• obtaining a first probability description of the performance parameter relating to a first structure feature and a second probability description of the performance parameter relating to a second structure feature;
• and
• determining, by a hardware computer system, a convolution probability distribution description from a convolution of the first probability description and the second probability description.

A non-transitory computer-readable medium having instructions therein configured to, upon execution by at least one processor, cause the at least one processor to at least:

• obtain a first probability description of a stochastic performance parameter relating to a first structure feature and a second probability description of the performance parameter relating to a second structure feature, the performance parameter being associated with a relative position of at least two structure features relating to one or more structures on a substrate resulting from a lithographic process;
• and
• determine a convolution probability distribution description from a convolution of the first probability description and the second probability description.