Film forming apparatus, control apparatus for film forming appartus, and film forming method

A control apparatus for controlling a film forming apparatus comprising:

• a process chamber;
• a processing unit provided in the process chamber configured to form an adhesive film;
• an exhaust unit capable of evacuating the process chamber;
• and
• a gas introduction unit introducing gas for forming the adhesive film in the process chamber,
• wherein the control apparatus further comprises a storing unit storing a control program,
• wherein the control program comprises:
• a first step of forming, on a surface of an inner wall of the process chamber, a material having a large getter effect on gas or water (H2O) remaining in the process chamber;
• a second step of exhausting the process chamber for a predetermined period of time after the first step;
• a third step of forming, on the surface of the inner wall of the process chamber, the material having a large getter effect on gas or water (H2O) remaining in the process chamber after the second step;
• a fourth step of exhausting the process chamber for a predetermined period of time after the third step;
• and
• an adhesive film forming step of forming the adhesive film on a substrate provided in the process chamber after the fourth step,
• wherein the exhaust unit and the gas introduction unit are controlled so that a duty cycle D=P1/P becomes 34% or more and 66% or less, when P1 is a time of the first step or the third step and P is a total time of the first step and the second step or a total time of the third step and the fourth step.