Method for producing nitrogen-containing organoxysilane compound
AssigneeShin-Etsu Chemical Co., Ltd.
InventorsMasato Kawakami, Yoichi Tonomura
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AssigneeShin-Etsu Chemical Co., Ltd.
InventorsMasato Kawakami, Yoichi Tonomura
Estimating the term…
A method for producing a compound (3), by reacting a compound (1) having R1 and R2 representing a hydrogen atom or a monovalent hydrocarbon group wherein a case where both R1 and R2 are a hydrogen atom is excluded, with a compound (2) having R3 representing a divalent hydrocarbon group, R4 and R5 representing a monovalent hydrocarbon group, X representing a halogen atom, and m representing an integer of 0 to 2 the method comprising the steps of: using 0.1 mol or more and less than 1 mol of a compound (4) having R6 representing a divalent hydrocarbon group and A representing a single bond or the like per 1 mol of the halogen atom in the compound (2), and liquefying a mixture of hydrogen halide salts of the compounds (1) and (4) generated as a by-product to separate the mixture from the compound (3) and removing the mixture.
A method for producing a nitrogen-containing organoxysilane compound having a general formula (3) described below:
A method for producing a nitrogen-containing organoxysilane compound having a general formula (3) described below:
Dependencies are inferred from the claim text.