Rinsing device for rinsing blue film at bottom of wafer

A rinsing device for rinsing a blue film at a bottom of a wafer, comprising:

• a base;
• a water tank disposed at the base, having an opening facing upward, and adapted to contain water;
• at least one drum, with its long axis extending in a front-rear direction, disposed at the water tank, wherein a portion of the at least one drum is disposed in the water tank, and another portion of the at least one drum is exposed from the opening and vertically protruded from the water tank;
• at least one drum driver disposed at the base, connected to the at least one drum, and adapted to drive the at least one drum rotating;
• two vertically-movable scraper sets disposed at the base, flanking the water tank, and each of the two vertically-movable scraper sets having a scraper, a water collection chamber and a vertically-movable driver, the respective scraper disposed above the respective water collection chamber, and the respective water collection chamber disposed at the respective vertically-movable driver, wherein the respective vertically-movable driver is disposed at the base and adapted to drive the respective water collection chamber and the respective scraper moving vertically;
• and
• a water tray disposed at the base, positioned at the water tank, and positioned below the two scrapers and the two water collection chambers.