# US 12,604,742 B2 · Layout design method and structure with enhanced process window > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 12,604,742 B2 - Document ID: US12604742B2 - Status: Granted - Kind: B2 - Application number: 18/157,887 - Filed: 2023-01-23 - Published: 2023-08-17 - Granted: 2026-04-14 - Earliest claimed: 2022-02-17 - Assignees: Taiwan Semiconductor Manufacturing Company, Ltd. - Applicants: Taiwan Semiconductor Manufacturing Company, Ltd. - Inventors: Jui-Tse Tsai; Szu-Ling Liu - Web page: https://patentgrep.com/patent/US12604742B2 ## CPC - H10W 46/00: Marks applied to devices, e.g. for alignment or identification - G06F 30/392: Floor-planning or layout, e.g. partitioning or placement - H10D 89/10: Integrated device layouts - G06F 30/398: Design verification or optimisation, e.g. using design rule check [DRC], layout versus schematics [LVS] or finite element methods [FEM] (optical proximity correction [OPC] design processes G03F1/36) - H10W 46/103: {alphanumeric information, e.g. words, letters or serial numbers} - H10W 46/401: {for identification or tracking} - H10W 46/601: {for use after dicing} - H10W: GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10 - G06F: ELECTRIC DIGITAL DATA PROCESSING (computer systems based on specific computational models G06N) - H10D: INORGANIC ELECTRIC SEMICONDUCTOR DEVICES ## Abstract The present disclosure provides a method that includes receiving a circuit layout that includes circuit features and a mark pattern to be formed on a same material layer over an integrated circuit (IC) substrate, the circuit features being longitudinally oriented along a first direction and being distanced from each other along a second direction that is orthogonal to the first direction; fragmenting the mark pattern to generate a fragmented mark pattern having fragmented mark features such that the fragmented mark features are configured in parallel and are longitudinally oriented along a third direction; and generating a modified circuit layout for circuit fabrication, the modified circuit layout including the circuit features and the fragmented mark pattern. ## Claims ### Claim 1 A method, comprising: receiving a circuit layout that includes circuit features and a mark pattern to be formed on a same material layer over an integrated circuit (IC) substrate, the circuit features being longitudinally oriented along a first direction and being distanced from each other along a second direction that is orthogonal to the first direction; fragmenting the mark pattern to generate a fragmented mark pattern having fragmented mark features such that the fragmented mark features are configured in parallel and are longitudinally oriented along a third direction; generating a modified circuit layout for circuit fabrication, the modified circuit layout including the circuit features and the fragmented mark pattern; grouping the fragmented mark features of the fragmented mark pattern into a first and second subsets and splitting the circuit features into a third and fourth subsets; performing a first lithography process using a first photomask with the first subset of the fragmented mark features and the third subset of the circuit features defined thereon; and performing a second lithography process using a second photomask with the second subset of the fragmented mark features and the fourth subset of the circuit features defined thereon. ### Claim 2 (depends on 1) The method of claim 1, wherein the fragmenting of the mark pattern includes abstracting, from the mark pattern, straight portions longitudinally oriented along the third direction. ### Claim 3 (depends on 2) The method of claim 2, wherein the abstracting straight portions of the mark pattern includes choosing a width and a spacing of the straight portions such that a process window of a subsequent process is increased. ### Claim 4 (depends on 3) The method of claim 3, wherein the subsequent process includes one of a chemical mechanical polishing (CMP) process and an etching process. ### Claim 5 (depends on 4) The method of claim 4, further comprising forming the material layer over the IC substrate according to the modified circuit layout, the material layer being patterned to include the circuit features and the fragmented mark features of the fragmented mark pattern. ### Claim 6 (depends on 5) The method of claim 5, wherein the circuit features are fin active regions, gate electrodes, metal lines, or bonding pads; and the forming of the material layer includes simultaneously forming the fragmented mark pattern and the circuit features on the IC substrate. ### Claim 7 (depends on 1) The method of claim 1, wherein the third direction is a tilted direction different from the first and second directions. ### Claim 8 (depends on 1) The method of claim 1, wherein the third direction is parallel with the first direction; and the circuit features include a width less than a width of the fragmented mark features. ### Claim 9 (depends on 1) The method of claim 1, wherein the mark pattern includes at least one of a character, a word, a number, a symbol, and a combination thereof. ### Claim 10 (depends on 1) The method of claim 1, wherein the fragmented mark features are configured as a periodic structure along a fourth direction being orthogonal to the third direction, wherein the fragmented mark features include a same width W, a same spacing S and a same pitch P, and wherein a ratio W/P ranges between 0.2 and 0.8. ### Claim 11 A method, comprising: receiving a circuit layout that includes circuit features and a mark pattern, the circuit features being longitudinally oriented along a first direction and being distanced from each other along a second direction that is orthogonal to the first direction; fragmenting the mark pattern to generate a fragmented mark pattern having fragmented mark features configured in parallel and oriented longitudinally along a tilted direction different from the first and second directions; grouping the fragmented mark features of the fragmented mark pattern into a first and second subsets and splitting the circuit features into a third and fourth subsets; and forming a patterned material layer on a semiconductor substrate, the patterned material layer including the circuit features and the fragmented mark features of the fragmented mark pattern, wherein the forming of the patterned material layer on the semiconductor substrate includes performing a first lithography process using a first photomask with the first subset of the fragmented mark features and the third subset of the circuit features defined thereon, and performing a second lithography process using a second photomask with the second subset of the fragmented mark features and the fourth subset of the circuit features defined thereon. ### Claim 12 (depends on 11) The method of claim 11, wherein the mark pattern includes at least one of a character, a word, a number, a symbol, and a combination thereof; and the circuit features are selected from the group consisting of fin active regions, gate electrodes, metal lines, and bonding pads. ### Claim 13 (depends on 11) The method of claim 11, wherein the fragmented mark features are configured as a periodic structure along a fourth direction being orthogonal to the third direction, wherein the fragmented mark features include a same width W, a same spacing S and a same pitch P, and wherein a ratio W/P ranges between 0.2 and 0.8. ### Claim 14 (depends on 11) The method of claim 11, wherein the fragmenting of the mark pattern includes abstracting, from the mark pattern, straight portions longitudinally oriented along the tilted direction. ### Claim 15 A method, comprising: receiving a circuit layout including a mark pattern having a first mark feature longitudinally oriented along a first direction and a second mark feature longitudinally oriented along a second direction being orthogonal to the first direction; abstracting portions of the first and second mark features such that the first and second mark features are converted into a plurality of derived mark features being configured in parallel and oriented longitudinally along a third direction different from the first and second directions, the plurality of derived mark features being spaced from each other along a fourth direction; and generating a modified circuit layout for circuit fabrication according to the plurality of derived mark features, wherein the circuit layout further includes circuit features to be formed with the derived mark features on a same layer over a semiconductor substrate; and the circuit features are configured in parallel and longitudinally oriented along a fifth direction. ### Claim 16 (depends on 15) The method of claim 15, wherein the derived mark features are configured as a periodic structure along the fourth direction being orthogonal to the third direction, wherein the derived mark features include a first width, a first spacing and a first pitch spanning along the fourth direction. ### Claim 17 (depends on 16) The method of claim 16, wherein the circuit features span a second width along a sixth direction being orthogonal to the fifth direction, the second width being less than the first width. ### Claim 18 (depends on 17) The method of claim 17, further comprising forming the circuit features and the derived mark features on the semiconductor substrate, wherein the forming the circuit features and the derived mark features includes defining the circuit features and the derived mark features on a same photomask, and forming the circuit features and the derived mark features on the semiconductor substrate simultaneously by a lithography process using the photomask. ### Claim 19 (depends on 18) The method of claim 18, wherein the mark pattern includes at least one of a character, a word, a number, a symbol, and a combination thereof; and the circuit features are selected from the group consisting of fin active regions; gate electrodes, metal lines, and bonding pads. ### Claim 20 (depends on 15) The method of claim 15, wherein the first mark feature is disposed in a first region and the second mark feature is disposed in a second region; the first and second mark features are connected; and at least one of the derived mark features extends longitudinally from the first region to the second region.