Lift-off method
AssigneeDisco Corporation
InventorsMasato Terajima, Junya Mimura, Tasuku Koyanagi, Hiroshi Morikazu, Yuki Suto
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AssigneeDisco Corporation
InventorsMasato Terajima, Junya Mimura, Tasuku Koyanagi, Hiroshi Morikazu, Yuki Suto
Estimating the term…
A lift-off method includes joining a transfer substrate to a face side of an optical device layer of an optical device wafer with a joining member interposed therebetween, thereby making up a composite substrate, applying a pulsed laser beam having a wavelength transmittable through the epitaxy substrate and absorbable by a buffer layer, from a reverse side of the epitaxy substrate of the optical device wafer, thereby breaking the buffer layer, and an optical device layer transferring step of peeling off the epitaxy substrate from the optical device layer and transferring the optical device layer to the transfer substrate. The optical device layer transferring step includes the step of applying a bending moment to an area of the composite substrate that includes an outer peripheral portion thereof while holding an area of the composite substrate that includes a central portion thereof.
A lift-off method of transferring an optical device layer to a transfer substrate from an optical device wafer where the optical device layer has been disposed on a face side of an epitaxy substrate with a buffer layer interposed therebetween, the method comprising:
A lift-off method of transferring an optical device layer to a transfer substrate from an optical device wafer where the optical device layer has been disposed on a face side of an epitaxy substrate with a buffer layer interposed therebetween, the method comprising:
A lift-off method of transferring an optical device layer to a transfer substrate from an optical device wafer where the optical device layer has been disposed on a face side of an epitaxy substrate with a buffer layer interposed therebetween, the method comprising:
Dependencies are inferred from the claim text.