Waste gas treatment apparatus for semiconductor and display processes

A waste gas treatment apparatus for semiconductor and display processes, the apparatus comprising:

• a pre-treatment unit having an inlet and an outlet formed therein, and configured to spray a cleaning solution to waste gas introduced through the inlet to primarily treat particulate matters and acid gas in the waste gas;
• a reaction unit configured to simultaneously treat fluorine compounds and nitrous oxide (N2O) in waste gas discharged from the pre-treatment unit;
• a post-treatment unit configured to spray a cleaning solution to waste gas discharged from the reaction unit to secondarily treat particulate matters and acid gas in the waste gas;
• and
• a heat exchange unit installed between the pre-treatment unit and the reaction unit, and comprising:
• a first heat exchange unit configured to primarily exchange heat of the waste gas discharged from the pre-treatment unit with the waste gas discharged from the reaction unit to adjust a temperature of the waste gas discharged from the pre-treatment unit;
• and
• a second heat exchange unit configured to exchange heat of the primarily heat-exchanged waste gas of the reaction unit with the waste gas introduced into the pre-treatment unit to pre-heat the waste gas.