# US 12,603,251 B2 · Hybrid chamber > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 12,603,251 B2 - Document ID: US12603251B2 - Status: Granted - Kind: B2 - Application number: 18/130,429 - Filed: 2023-04-04 - Published: 2023-10-12 - Granted: 2026-04-14 - Earliest claimed: 2022-04-08 - Assignees: Tes Co., Ltd - Applicants: Tes Co., Ltd - Inventors: Jae-Woo Kim; Sang-Woo Cho - Web page: https://patentgrep.com/patent/US12603251B2 ## CPC - H01J 37/3244: {Gas supply means} - H01J 37/32082: {Radio frequency generated discharge (H01J37/32357, H01J37/32366, H01J37/32394 and H01J37/32403 take precedence)} - H01J 37/32522: {Temperature} - H01J 2237/024: Moving components not otherwise provided for - H01J 2237/334: Etching - H01J 2237/335: Cleaning - H01J: ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS (spark-gaps H01T; electric arc lamps H05B31/00; particle accelerators H05H) ## Abstract The present invention relates to a hybrid chamber, and more specifically, to a hybrid chamber capable of performing both a gas phase etching (GPE) process for removing oxide from a substrate and a radical dry cleaning (RDC) process for removing nitride from the substrate in one chamber. ## Claims ### Claim 1 A hybrid chamber comprising: a chamber unit providing a processing space for a substrate, wherein the chamber unit comprises: a first chamber body; a second chamber body rotatably coupled to the first chamber body; and a third chamber body rotatably coupled to the second chamber body; a heat exchange plate provided in an upper portion of the third chamber body; a gas supply unit provided in an upper portion of the third chamber body to supply at least one of process gas and plasma toward the substrate; and a lamp unit embedded in a sidewall of the second chamber body provided in the chamber unit to heat the substrate, wherein the gas supply unit comprises: a gas inflow device formed to protrude from the heat exchange plate into which at least two process gases are introduced through gas inlets facing each other; a first showerhead coupled to the third chamber body for dispersing the process gases below the gas inflow device; and a second showerhead coupled to an upper portion of the sidewall of the second chamber body to form a plasma space with the first showerhead and to supply at least one of the process gases and plasma toward the substrate, wherein the lamp unit comprises: a recess embedded in a lower portion of the sidewall of the second chamber body; a lamp disposed in the recess; and a transparent window blocking the recess from the processing space, wherein the transparent window is flushed with an inner surface of the sidewall of the second chamber body. ### Claim 2 (depends on 1) The hybrid chamber according to claim 1, wherein an RF power source is connected to any one of the first showerhead and the second showerhead, and the other one is grounded. ### Claim 3 (depends on 1) The hybrid chamber according to claim 1, further comprising: a side gas supply line formed in the upper portion of the sidewall of the second chamber body and connected to the second showerhead. ### Claim 4 (depends on 3) The hybrid chamber according to claim 3, wherein the second showerhead comprises: a through hole for supplying at least one of process gas and plasma provided in the plasma space; and a supply hole for supplying process gas supplied through the side gas supply line. ### Claim 5 (depends on 1) The hybrid chamber according to claim 1, wherein the volume of the plasma space is adjusted. ### Claim 6 (depends on 1) The hybrid chamber according to claim 1, further comprising: an isolator provided at the edge of the plasma space to limit the plasma space. ### Claim 7 (depends on 1) The hybrid chamber according to claim 1, wherein a relative distance between the first showerhead and the second showerhead is adjusted to adjust the volume of the plasma space. ### Claim 8 (depends on 7) The hybrid chamber according to claim 7, wherein the first showerhead is provided to be able to go up and down with respect to the second showerhead. ### Claim 9 (depends on 8) The hybrid chamber according to claim 8, wherein the chamber unit further comprises a heat exchange plate connected to a top of the third chamber body, wherein the first showerhead is connected to the heat exchange plate, and wherein the hybrid chamber further comprises: lifting modules for vertically moving the heat exchange plate; and a variable insulating member provided under the heat exchange plate to insulate the first showerhead from the second showerhead and being capable of vertically extending and contracting. ### Claim 10 (depends on 1) The hybrid chamber according to claim 1, wherein the chamber unit further comprises a heat exchange plate connected to a top of the third chamber body, wherein the first chamber body includes a susceptor on which the substrate is seated. ### Claim 11 (depends on 1) The hybrid chamber according to claim 1, wherein the lamp unit further includes a reflector, which is attached onto an inner wall of the recess or seals an upper portion of the recess to reflect heat of the lamp. ### Claim 12 A hybrid chamber comprising: a chamber unit providing a processing space for a substrate, wherein the chamber unit comprises: a first chamber body; a second chamber body rotatably coupled to the first chamber body; and a third chamber body rotatably coupled to the second chamber body; a heat exchange plate provided in an upper portion of the third chamber body; a gas supply unit provided in an upper portion of the third chamber body to supply at least one of process gas and plasma toward the substrate; and a lamp unit coupled to the second chamber body to heat the substrate, wherein the gas supply unit comprises: a gas inflow device formed to protrude from the heat exchange plate into which at least two process gases are introduced through gas inlets facing each other; a first showerhead coupled to the third chamber body for dispersing the process gases below the gas inflow device; and a second showerhead coupled to an upper portion of the second chamber body to form a plasma space with the first showerhead and to supply at least one of the process gases and plasma toward the substrate, wherein the lamp unit comprises: a tube coupled to a lower portion of the second chamber body; and a lamp arranged inside of the tube.