US 12,601,972 B2 · Resist underlayer film-forming composition with suppressed degeneration of crosslinking agent

Abstract

A resist underlayer film forming composition which has high storage stability, has a low film curing start temperature, can cause the generation of a sublimated product in a reduced amount, and enables the formation of a film that is rarely eluted into a photoresist solvent; a method for forming a resist pattern using the resist underlayer film forming composition; and a method for manufacturing a semiconductor device. The resist underlayer film forming composition includes a crosslinkable resin, a crosslinking agent, a crosslinking catalyst represented by formula (I) and a solvent. (A-SO3)−(BH)+[wherein A represents a linear, branched or cyclic saturated or unsaturated aliphatic hydrocarbon group which may be substituted, an aryl group which may be substituted by a group other than a hydroxy group, or a heteroaryl group which may be substituted; and B represents a base having a pKa value of 6.5 to 9.5.]

Claims19

Dependent claims

A resist underlayer film-forming composition comprising a crosslinkable resin, a crosslinking agent, a crosslinking catalyst represented by the following formula (I), and a solvent:

(A-SO3)−(BH)+ (I)
wherein A is a linear, branched, or cyclic saturated or unsaturated aliphatic hydrocarbon group which may be substituted, an aryl group which may be substituted with one or more groups other than hydroxy group, or a heteroaryl group which may be substituted, and
B is a base having a pKa of 6.5 to 9.5, and is represented by R1R2R3N,
where R1 and R2 each independently represent a linear or branched, saturated or unsaturated aliphatic hydrocarbon group which may be substituted,
R1 and R2 may form a ring with or without a heteroatom,
R3 represents an aromatic group which may be substituted, or a linear or branched, saturated or unsaturated aliphatic hydrocarbon group which may be substituted, and
when R1 and R2 do not form a ring, R3 is an aromatic group which may be substituted.

4 more elements

Dependencies are inferred from the claim text.

Resist underlayer film-forming composition with suppressed degeneration of crosslinking agent

Life of this patent

Resist underlayer film-forming composition with suppressed degeneration of crosslinking agent

Life of this patent

Abstract

Claims19