# US 12,601,971 B2 · Negative photosensitive resin composition

> Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt

- Number: US 12,601,971 B2
- Document ID: US12601971B2
- Status: Granted
- Kind: B2
- Application number: 18/044,082
- Filed: 2021-09-13
- Published: 2023-09-28
- Granted: 2026-04-14
- Earliest claimed: 2020-09-29
- Assignees: Zeon Corporation
- Applicants: Zeon Corporation
- Inventors: Takashi Tsutsumi
- Web page: https://patentgrep.com/patent/US12601971B2

## CPC

- G03F 7/038: Macromolecular compounds which are rendered insoluble or differentially wettable (G03F7/075 takes precedence; macromolecular azides G03F7/012; macromolecular diazonium compounds G03F7/021)
- G03F 7/0388: {with ethylenic or acetylenic bands in the side chains of the photopolymer}
- C08F 299/02: from unsaturated polycondensates
- C08G 61/06: prepared by ring-opening of carbocyclic compounds
- G03F 7/0045: {with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors}
- G03F 7/029: Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
- G03F 7/031: Organic compounds not covered by group G03F7/029
- G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G)
- C08F: MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08G: MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS

## Abstract

Provided is a negative photosensitive resin composition. The negative photosensitive resin composition contains a polymer and a photo-radical generator. The polymer includes a structural unit (I) represented by formula (I), shown below, and a structural unit (II) represented by formula (II), shown below. In formula (I), R1 to R3 each indicate, independently of one another, a hydrogen atom, an alkyl group, or an aromatic ring group, R1 to R3 may be bonded to form a ring, R4 indicates a hydrogen atom or an alkyl group, X indicates an alkylene group having a carbon number of 1 to 10, and m indicates 0, 1, or 2. In formula (II), R5 to R8 each indicate, independently of one another, a hydrogen atom, an alkyl group, or an aromatic ring group, R5 to R8 may be bonded to form a ring, and n indicates 0, 1, or 2.

## Claims

### Claim 1

A negative photosensitive resin composition comprising:
a polymer; and
a photo-radical generator, wherein
the polymer includes a structural unit (I) represented by formula (I), shown below, and a structural unit (II) represented by formula (II), shown below,
where, in formula (I), R1 to R3 each indicate, independently of one another, a hydrogen atom, an alkyl group, or an aromatic ring group, R1 to R3 may be bonded to form a ring, R4 indicates a hydrogen atom or an alkyl group, X indicates an alkylene group having a carbon number of 1 to 10, and m indicates 0, 1, or 2, and
in formula (II), R5 to R8 each indicate, independently of one another, a hydrogen atom, an alkyl group, or an aromatic ring group, R5 to R8 may be bonded to form a ring, and n indicates 0, 1, or 2.

### Claim 2 (depends on 1)

The negative photosensitive resin composition according to claim 1, wherein the photo-radical generator is an acylphosphine oxide photo-radical generator or an oxime ester photo-radical generator.

### Claim 3 (depends on 1)

The negative photosensitive resin composition according to claim 1, wherein content of the photo-radical generator is more than 0.5 parts by mass and not more than 25 parts by mass per 100 parts by mass of the polymer.

### Claim 4 (depends on 1)

The negative photosensitive resin composition according to claim 1, wherein proportional content of the structural unit (I) in the polymer is not less than 3 mol % and not more than 70 mol %.