Optical device and method of manufacture
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsChen-Hua Yu, Sey-Ping Sun, Shih Wei Liang
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Abstract
Optical devices and methods of manufacture are provided which form a first active layer of optical devices. After the first active layer of optical devices is formed, a second active layer of optical devices is manufactured over the first active layer of optical devices, wherein the second active layer of optical devices is formed to create the optical devices with crystalline material.
Claims20
A method of manufacturing an optical device, the method comprising:
- forming a first active layer of first optical components on a substrate, the first active layer of first optical components comprising optical modulators, an amplifier, and a waveguide;
- depositing a cladding material over the waveguide, the cladding material comprising a dielectric material;
- and
- after the forming the first active layer and the depositing the cladding material, manufacturing second optical components with a crystalline semiconductor material, wherein the manufacturing the second optical components comprises forming a crystalline silicon waveguide, second optical modulators, and a second amplifier.
A method of manufacturing an optical device, the method comprising:
- depositing a core material on a substrate;
- annealing the core material;
- after the annealing, forming a waveguide, an amplifier, and an optical modulator from the core material;
- and
- after the forming the waveguide, forming optical devices over the core material, a waveguide within the optical devices comprising a crystalline material after the forming the optical devices, the optical devices comprising a second amplifier and a second optical modulator.
A method of manufacturing an optical device, the method comprising:
- receiving a substrate;
- depositing a cladding material over the substrate;
- depositing a core material over the cladding material;
- shaping the core material into a shape for a waveguide and a micro-ring resonator;
- annealing the core material at a temperature greater than 1,100° C. to remove defects;
- after the annealing, forming a crystalline material over the core material;
- patterning the crystalline material to form an optical component from the crystalline material, the optical component being a crystal silicon waveguide;
- and
- forming metallization layers over the optical component.
Dependencies are inferred from the claim text.