Methods of manufacturing plasma generating cells for a plasma source
AssigneeApplied Materials, Inc.
InventorsDavid John Jorgensen, Jian Wu, Vladimir Nagorny, Hugo Rivera
Life of this patent
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Abstract
A method of manufacturing a dielectric barrier discharge (DBD) structure includes forming a patterned electrode layer around an outer perimeter of a substrate composed of a dielectric material. The patterned electrode layer includes multiple electrodes around the outer perimeter of the substrate and gaps between adjacent electrodes. The method further includes depositing a dielectric layer over at least a first region of the patterned electrode layer to form a DBD region of the DBD structure.
Claims20
A method of manufacturing a dielectric barrier discharge (DBD) structure, the method comprising:
- forming a patterned electrode layer around an outer surface of a substrate composed of a dielectric material, wherein the substrate is a dielectric rod, the patterned electrode layer comprising a plurality of electrodes around the outer surface of the substrate and gaps between adjacent electrodes of the plurality of electrodes, wherein the plurality of electrodes extend longitudinally along the dielectric rod from a first end of the dielectric rod to a second end of the dielectric rod;
- and
- depositing a dielectric layer over at least a first region of the patterned electrode layer to form a DBD region of the DBD structure.
A method comprising:
- roughening an outer surface of a dielectric rod by an abrasive machining operation or a media blasting operation to form a roughened outer surface of the dielectric rod;
- depositing an electrode layer on the roughened outer surface of the dielectric rod by a metallization process or by an electron beam ion assisted deposition (EB-IAD) process, wherein the electrode layer comprises at least one of a metal, a metal alloy, or a conductive oxide;
- removing at least a portion of the electrode layer by a machining process or by an etching process to form a plurality of gaps in the electrode layer, wherein each gap of the plurality of gaps separates an electrode from an adjacent electrode, and wherein the electrode and the adjacent electrode extend longitudinally along the dielectric rod from a first end of the dielectric rod to a second end of the dielectric rod;
- and
- depositing a dielectric layer over at least a first region of the electrode layer to form a dielectric barrier discharge region.
A method comprising:
- smoothing a surface of a dielectric rod by a polishing operation to form a smoothed surface of the dielectric rod;
- depositing a mask layer over at least the smoothed surface of the dielectric rod;
- patterning the mask layer to expose a plurality of electrode regions on the smoothed surface of the dielectric rod;
- depositing a metal layer or a conductive oxide layer over the mask layer and the plurality of electrode regions to form a plurality of electrodes on the plurality of electrode regions;
- removing the mask layer to form a plurality of gaps, wherein each gap of the plurality of gaps separates an electrode from an adjacent electrode;
- and
- depositing a dielectric layer over at least a first region of the plurality of electrodes to form a dielectric barrier discharge region,
- wherein the electrode and the adjacent electrode extend longitudinally along the dielectric rod from a first end of the dielectric rod to a second end of the dielectric rod.
Dependencies are inferred from the claim text.