# US 12,601,062 B2 · Multi-port gas injection system and reactor system including same

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- Number: US 12,601,062 B2
- Document ID: US12601062B2
- Status: Granted
- Kind: B2
- Application number: 17/352,011
- Filed: 2021-06-18
- Published: 2021-10-07
- Granted: 2026-04-14
- Earliest claimed: 2018-08-06
- Assignees: ASM IP Holding B.V.
- Applicants: ASM IP Holding B.V.
- Inventors: Mingyang Ma; Junwei Su; Alexandros Demos; Xing Lin; Sam Kim; Gregory Michael Bartlett
- Web page: https://patentgrep.com/patent/US12601062B2

## CPC

- C23C 16/52: Controlling or regulating the coating process {(C23C16/45557, C23C16/279 take precedence)}
- B01J 4/008: {Feed or outlet control devices}
- C23C 16/4401: {Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber}
- C23C 16/45502: {Flow conditions in reaction chamber}
- C23C 16/45523: {Pulsed gas flow or change of composition over time}
- C23C 16/45561: {Gas plumbing upstream of the reaction chamber}
- C23C 16/45574: {Nozzles for more than one gas}
- C23C 16/45587: {Mechanical means for changing the gas flow}
- H01J 37/3244: {Gas supply means}
- H01J 37/32449: {Gas control, e.g. control of the gas flow}
- C23C: COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL (making metal-coated products by extrusion B21C23/22; covering with metal by connecting pre-existing layers to articles, see the relevant places, e.g. B21D39/00, B23K; metallising of glass C03C; metallising mortars, concrete, artificial stone, ceramics or natural stone C04B41/00; enamelling of, or applying a vitreous layer to, metals C23D; treating metal surfaces or coating of metals by electrolysis or electrophoresis C25D; single-crystal film growth C30B; by metallising textiles D06M11/83; decorating textiles by locally metallising D06Q1/04)
- B01J: CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- H01J: ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS (spark-gaps H01T; electric arc lamps H05B31/00; particle accelerators H05H)

## Abstract

A gas injection system, a reactor system including the gas injection system, and methods of using the gas injection system and reactor system are disclosed. The gas injection system can be used in gas-phase reactor systems to independently monitor and control gas flow rates in a plurality of channels of a gas injection system coupled to a reaction chamber.

## Claims

### Claim 1

A gas injection system, comprising:
a first gas supply line;
a second gas supply line;
a first gas manifold coupled to the first gas supply line having a plurality of first gas outlets;
a second gas manifold coupled to the second gas supply line having a plurality of second gas outlets;
a plurality of mass flow sensors, wherein at least one of the plurality of mass flow sensors is coupled to each of the plurality of first gas outlets and the plurality of second gas outlets;
a plurality of gas valves, wherein at least one of the plurality of gas valves is coupled to an outlet of each of the plurality of mass flow sensors;
a plurality of first gas channels, wherein each of the plurality of first gas channels connects one of the plurality of first gas outlets to a flange, and wherein each of the plurality of first gas channels is coupled to one of a plurality flange gas channels disposed within the flange;
a plurality of second gas channels, wherein each of the plurality of second gas channels connects one of the plurality of second gas outlets to the flange, and wherein each of the plurality of second gas channels is coupled to one of a plurality flange gas channels disposed within the flange; and
a controller disposed in communication with the plurality of mass flow sensors and operatively connected to the plurality of gas valves, the controller responsive to instructions recorded on a non-transitory machine-readable memory to:
receive a flow ratio setpoint for each of the plurality of first gas valves;
receive a measurement of gas flow through each of the plurality of first gas valves;
determine a flow ratio of gas through each of the plurality of first gas valves;
compare the determined flow ratio to the received flow ratio set point for each of the plurality of first gas valves; and
control gas flow through each of the first gas valves using the comparison of the received flow ratio setpoint to the determined flow ratio for each of the plurality of first gas valves,
wherein a flow ratio of gas for a first gas valve is determined by dividing the measurement of gas flow through the first gas valve by a total flow rate, wherein the total flow rate is calculated by summing the measurements of gas flow through each of the plurality of first gas valves.

### Claim 2 (depends on 1)

The gas injection system of claim 1, wherein the flow ratio through each of the plurality of first gas valves is determined by:
calculating a total gas flow through the plurality of first gas valves by adding the received measurements of gas flow through each of the plurality of first gas valves together; and
dividing gas flow through each of the plurality of first gas valves individually by the calculated total gas flow through the plurality of first gas valves.

### Claim 3 (depends on 1)

The gas injection system of claim 1, wherein controlling gas flow through each of the plurality of first gas valves comprises overriding control functions of a plurality of mass flow controllers operatively connected to the plurality of first gas valves.

### Claim 4 (depends on 1)

The gas injection system of claim 1, wherein controlling gas flow through each of the plurality of first gas valves comprises determining an error function for each of the plurality of first gas valves.

### Claim 5 (depends on 4)

The gas injection system of claim 4, wherein the error function comprises a difference between the received flow ratio setpoint and the determined flow ratio for each of the plurality of first gas valves.

### Claim 6 (depends on 4)

The gas injection system of claim 4, wherein the controller comprises a plurality of proportional-integral-derivative (PID) controllers operatively connected to the plurality of first gas valves, wherein controlling the plurality of gas valves comprises providing error functions for each of the plurality of first gas valves to the plurality of PID controllers.

### Claim 7 (depends on 4)

The gas injection system of claim 4, wherein the plurality of first gas valves comprises five (5) gas valves, wherein the plurality of mass flow sensors comprises five (5) mass flow sensors.

### Claim 8 (depends on 1)

The gas injection system of claim 1, wherein the controller is configured to provide closed-loop control of the plurality of gas valves.

### Claim 9 (depends on 1)

The gas injection system of claim 1, wherein the controller is configured to provide open-loop control of the plurality of first gas valves.

### Claim 10 (depends on 1)

The gas injection system of claim 1, wherein the controller is configured to provide open-loop control and closed-loop control of the plurality of first gas valves.

### Claim 11 (depends on 1)

The gas injection system of claim 1, wherein each of the plurality of flange gas channels coupled to a first gas channels are disposed alternating adjacent to a flange gas channel coupled to a second gas channel.

### Claim 12 (depends on 1)

The gas injection system of claim 1, wherein the plurality of flange gas channels in the flange are disposed linearly.

### Claim 13 (depends on 1)

The gas injection system of claim 1, wherein the plurality of flange gas channels are disposed above an opening in the flange configured to allow a substrate to pass though.

### Claim 14 (depends on 1)

The gas injection system of claim 1, wherein the controller is further responsive to instructions recorded on a non-transitory machine-readable memory to:
receive a second flow ratio setpoint for each of the plurality of second gas valves;
receive a measurement of gas flow through each of the plurality of second gas valves;
determine a second flow ratio of gas through each of the plurality of second gas valves;
compare the determined second flow ratio to the received second flow ratio set point for each of the plurality of second gas valves; and
control gas flow through each of the second gas valves using the comparison of the received second flow ratio setpoint to the determined second flow ratio for each of the plurality of second gas valves,
wherein a flow ratio of gas for a second gas valve is determined by dividing the measurement of gas flow through the second gas valve by a total flow rate, wherein the total flow rate is calculated by summing the measurements of gas flow through each of the plurality of second gas valves.