Substrate receiving area for process chambers
AssigneeCemeCon AG
InventorWalter May
Life of this patent
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AssigneeCemeCon AG
InventorWalter May
Estimating the term…
The present disclosure relates to a device for holding workpieces in a process chamber. The present disclosure additionally relates to a coating system and to a method for coating a workpiece. In order to allow for precise adjustment of the height of the position of workpieces while supporting same in a secure and stable manner, the holding device includes a platform for the workpieces, a height-adjustable first support element and a height-adjustable second support element for the platform, wherein each of the support elements has at least one first and one second limb element, wherein the respective first and the respective second limb element are coupled so as to be pivotable relative to one another about a pivot axis, and wherein the pivot axis of the first support element is arranged at an angle to the pivot axis of the second support element.
A coating system, comprising
A coating system, comprising
Dependencies are inferred from the claim text.