Method for manufacturing a thin-film lithiated material

A method for manufacturing a lithiated material on a substrate, said lithiated material comprising multiple thin layers and said method comprising the following steps:

• a) placing a substrate made of a material intended to be used in a battery in a reaction chamber,
• c1) at least one atomic layer deposition of a precursor of a first metal, selected from among nickel, manganese, cobalt, chromium, lanthanum, niobium, vanadium, iron, titanium, and aluminum, through said reaction chamber, on at least part of a surface of said substrate,
• c2) at least one purge of said reaction chamber,
• c3) at least one diffusion of a first oxidizing species through said reaction chamber to obtain a thin layer of an oxide of the first metal,
• c4) at least one purge of said reaction chamber,
• f1) at least one atomic layer deposition of a lithium precursor through said reaction chamber on top of said thin layer of an oxide of a first metal to form a lithiated thin layer,
• f2) at least one purge of said reaction chamber,
• said method being characterized in that it further comprises, after step f2), a crystallization annealing step g) at a temperature of between 600° C. and 800° C. for a period of between 1 and 4 hours to obtain a lithiated material,
• wherein said lithiated material is a positive electrode and wherein step f2) is performed after forming the lithiated thin layer in step f1), and wherein the crystallization annealing step g) is performed after step f2) with the lithiated thin layer as a surface layer.