Manufacturing equipment for light-emitting device
AssigneeSemiconductor Energy Laboratory Co., Ltd.
InventorsShunpei Yamazaki, Ryota Hodo, Yasuhiro Jinbo, Kenichi Okazaki
Life of this patent
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Abstract
Manufacturing equipment in which processes from processing to sealing of an organic compound film can be successively performed is provided. A patterning process of a light-emitting device and a sealing process that is performed to prevent the surface and side surface of an organic layer from being exposed to the air can be performed successively, whereby a minute light-emitting device with high luminance and high reliability can be formed. Moreover, the manufacturing equipment can be incorporated in in-line manufacturing equipment where apparatuses are arranged in the order of processes for a light-emitting device, resulting in high throughput manufacturing.
Claims16
Manufacturing equipment for a light-emitting device, comprising:
- a load chamber;
- a first etching apparatus;
- a plasma treatment apparatus;
- a standby chamber;
- a deposition apparatus;
- a second etching apparatus;
- an unload chamber;
- a transfer chamber;
- and
- a carrying device,
- wherein the carrying device is provided in the transfer chamber,
- wherein the load chamber, the first etching apparatus, the plasma treatment apparatus, the standby chamber, the deposition apparatus, the second etching apparatus, and the unload chamber are each connected to the transfer chamber through a gate valve,
- wherein the carrying device is configured to transfer an object to be processed from one of the load chamber, the first etching apparatus, the plasma treatment apparatus, the standby chamber, the deposition apparatus, the second etching apparatus, and the unload chamber to another one of the load chamber, the first etching apparatus, the plasma treatment apparatus, the standby chamber, the deposition apparatus, the second etching apparatus, and the unload chamber,
- wherein the object to be processed comprising an organic compound film over a substrate, a first inorganic film over the organic compound film, and a resist mask over the first inorganic film is carried into the load chamber,
- wherein the object to be processed is carried to the first etching apparatus, the plasma treatment apparatus, the standby chamber, the deposition apparatus, and the second etching apparatus in this order, and
- wherein the organic compound film is processed into an island-shaped organic compound layer, a protective layer is formed on a side surface of the island-shaped organic compound layer, and the object to be processed is carried out to the unload chamber.
Manufacturing equipment for a light-emitting device, comprising:
- a load chamber;
- a first etching apparatus;
- a plasma treatment apparatus;
- a standby chamber;
- a deposition apparatus;
- a second etching apparatus;
- an unload chamber;
- a transfer chamber;
- and
- a carrying device,
- wherein the carrying device is provided in the transfer chamber,
- wherein the carrying device is configured to transfer an object to be processed between the load chamber, the first etching apparatus, the plasma treatment apparatus, the standby chamber, the deposition apparatus, the second etching apparatus, and the unload chamber,
- wherein the object to be processed is carried into the load chamber,
- wherein the object to be processed is carried to the first etching apparatus, the plasma treatment apparatus, the standby chamber, the deposition apparatus, and the second etching apparatus in this order, and
- wherein the object to be processed is carried out to the unload chamber.
Dependencies are inferred from the claim text.