Substrate processing apparatus using supercritical fluid and driving method thereof
AssigneeSamsung Electronics Co., Ltd.
InventorsSang Jine Park, Ji Hwan Park, Kun Tack Lee
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Abstract
A substrate processing apparatus includes a reactor having a processing space formed therein, a fluid supply unit supplying a supercritical fluid into the processing space of the reactor, and a controller controlling the reactor and the fluid supply unit. The controller controls, in response to whether a state of the supercritical fluid supplied to the reactor satisfies a set condition, the reactor and the fluid supply unit to perform one of cleaning of the processing space by using the supercritical fluid and drying of a substrate seated in the processing space by using the supercritical fluid.
Claims8
A substrate processing apparatus comprising:
- a reactor having a processing space formed therein;
- a fluid supply unit supplying a supercritical fluid into the processing space of the reactor;
- and
- a controller configured to control the reactor and the fluid supply unit,
- wherein the controller controls, in response to whether a state of the supercritical fluid supplied to the reactor satisfies a set condition, the reactor and the fluid supply unit to perform one of cleaning of the processing space by using the supercritical fluid and drying of a substrate seated in the processing space by using the supercritical fluid.
Dependencies are inferred from the claim text.