Liquid filter apparatus with thermal shield
AssigneeEdwards Vacuum LLC
InventorImad Mahawili
Life of this patent
Estimating the term…
Abstract
A liquid filter apparatus for gas/solid separation includes a housing with a filter chamber, a semiconductor process gas inlet, and a process gas outlet. The filter chamber forms a liquid reservoir, and the semiconductor process gas inlet and the process gas outlet are in communication with the filter chamber. The housing further includes a filter liquid inlet and a filter liquid outlet, which are in communication with the liquid reservoir for delivering and removing filter fluid, respectively, to and from the liquid reservoir.
Claims21
A liquid filter apparatus for semiconductor process waste, said liquid filter apparatus comprising:
- a housing having a filter chamber, a process waste inlet for communication with a source of semiconductor process waste gasses or plasma with a temperature in a range of 200-600 degrees C., a process waste outlet, and a feed tube being in communication with said process waste inlet and extending into said filter chamber, said feed tube having a feed tube outlet, said filter chamber forming a liquid reservoir holding a chemically inert filter liquid with a vapor pressure below approximately 10-7 torr therein, said feed tube outlet being above the liquid filter, and said process waste outlet in communication with said filter chamber;
- and
- a thermal shield interposed between the filter liquid and said feed tube outlet and above the filter liquid, said thermal shield being adjacent the feed tube outlet and being configured to deflect the semiconductor process waste as it exits the feed tube outlet to prevent direct impingement of the semiconductor process waste flowing from the feed tube with the filter liquid and further forming a volume into which the semiconductor process waste flows from said feed tube outlet to absorb heat from the semiconductor process waste prior to the semiconductor process waste flowing into the filter liquid.
A liquid filter apparatus for semiconductor process waste, said liquid filter apparatus comprising:
- a housing having a filter chamber, a process waste inlet for communication with a source of semiconductor process waste gasses or plasma with a temperature in a range of 200-600 degrees C., a process waste outlet, and a feed tube in communication with said process waste inlet and said filter chamber, said feed tube having a feed tube outlet, said filter chamber forming a liquid reservoir holding a chemically inert filter liquid with a vapor pressure below approximately 10−7 torr therein, and said process waste outlet in communication with said filter chamber;
- a deflecting surface interposed between the filter liquid and said feed tube outlet and above the filter liquid, said deflecting surface being adjacent the feed tube outlet to deflect the semiconductor process waste as it exits the feed tube outlet to prevent direct impingement of the semiconductor process waste flowing from the feed tube with the filter liquid and further absorbing heat from the semiconductor process waste prior to the semiconductor process waste flowing into the filter liquid;
- and
- a thermal shield, said thermal shield including a cup-shaped body, and said cup-shaped body forming said deflecting surface and forming a first volume into which the semiconductor process waste flows from said feed tube.
Dependencies are inferred from the claim text.