Electrostatic chuck heater and film deposition apparatus

An electrostatic chuck heater comprising:

• a ceramic plate having a first surface for bearing a wafer, and a second surface opposite the first surface, and comprising ESC electrodes and a heater electrode which are built therein;
• a ceramic shaft which is attached to the second surface of the ceramic plate and which comprises an internal space for accommodating an ESC rod connected to the ESC electrodes and a heater rod connected to the heater electrode;
• a plurality of lift pin holes penetrating the ceramic plate from the first surface to the second surface;
• and
• a plurality of protrusions arranged on the first surface of the ceramic plate with equal spacing from each other and with rotational symmetry about a central axis of each of the lift pin holes;
• and
• wherein the plurality of protrusions are arranged according to a regular pattern with one selected from the group consisting of a circle, an equilateral triangle, and a regular hexagon as a constituent unit.