# US 12,595,196 B2 · PH-adjusted water production device

> Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt

- Number: US 12,595,196 B2
- Document ID: US12595196B2
- Status: Granted
- Kind: B2
- Application number: 17/610,430
- Filed: 2020-02-25
- Published: 2022-08-04
- Granted: 2026-04-07
- Earliest claimed: 2019-06-12
- Assignees: Kurita Water Industries Ltd.
- Applicants: Kurita Water Industries Ltd.
- Inventors: Hideaki Iino
- Web page: https://patentgrep.com/patent/US12595196B2

## CPC

- C02F 1/66: by neutralisation; pH adjustment (for degassing C02F1/20; using ion-exchange C02F1/42; for flocculation or precipitation of suspended impurities C02F1/52; for removing dissolved compounds C02F1/58)
- B01D 61/00: Processes of separation using semi-permeable membranes, e.g. dialysis, osmosis or ultrafiltration; Apparatus, accessories or auxiliary operations specially adapted therefor (separation of gases or vapours by diffusion B01D53/22)
- B01D 61/58: Multistep processes
- B01F 21/00: Dissolving (separating by dissolving B01D; dissolving to effect cooling F25D5/00)
- B01F 23/20: Mixing gases with liquids
- B01F 25/50: Circulation mixers, e.g. wherein at least part of the mixture is discharged from and reintroduced into a receptacle
- C02F 1/20: by degassing, i.e. liberation of dissolved gases (degasification of liquids in general B01D19/00; arrangement of degassing apparatus in boiler feed supply F22D)
- C02F 1/42: by ion-exchange (ion-exchange in general B01J)
- C02F 9/00: Multistage treatment of water, waste water or sewage
- H10P 52/00: Grinding, lapping or polishing of wafers, substrates or parts of devices
- C02F 1/70: by reduction {(C02F1/4676 takes precedence)}
- C02F 2103/04: for obtaining ultra-pure water
- C02F 2209/06: pH
- C02F 2301/08: Multistage treatments, e.g. repetition of the same process step under different conditions
- C02F: TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE (separation in general B01D; special arrangements on waterborne vessels of installations for treating water, waste water or sewage, e.g. for producing fresh water, B63J; adding materials to water to prevent corrosion C23F; treating radioactively-contaminated liquids G21F9/04; regeneration of reactants for recirculation into processes, see the relevant places for the processes)
- B01D: SEPARATION (separating solids from solids by wet methods B03B, B03D; by pneumatic jigs or tables B03B; by other dry methods B07; magnetic or electrostatic separation of solid materials from solid materials or fluids, separation by high-voltage electric fields B03C; centrifuges, vortex apparatus B04; presses per se for squeezing-out liquid from liquid-containing material B30B9/02; treatment of water C02F, e.g. softening by ion-exchange C02F1/42; {arrangements of air intake cleaners in gas turbine plants F02C7/05} ; arrangements or mounting of filters in air-conditioning, air-humidification or ventilation F24F13/28)
- B01F: MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING (mixing paints B44D3/06)
- H10P: GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10

## Abstract

A pH-adjusted water production device has a configuration in which a platinum group metal support resin column, a membrane-type degassing device, and a gas dissolving membrane device are provided on an ultra-pure water supply line, and a pH-adjuster injection device is provided between the platinum group metal support resin column and the membrane-type degassing device. An inert gas source is connected to the gas phase side of the membrane-type degassing device while an inert gas source is connected also on the gas phase side of the gas dissolving membrane device, and a discharge line communicates with the gas dissolving membrane device.

## Claims

### Claim 1

A method of providing pH-adjusted water production comprising sequentially providing: a platinum group metal support resin column and a membrane-type degassing device on an ultra-pure water supply line, wherein the membrane-type degassing device includes a membrane,
providing a pH-adjuster injection device, configured to inject a pH adjuster, is between the platinum group metal support resin column and the membrane-type degassing device, wherein the pH adjuster is ammonia, hydrochloric acid, citric acid or hydrofluoric acid,
providing an inert gas dissolving device, configured to dissolve an inert gas, at a stage subsequent to the membrane-type degassing device,
providing a gas concentration measurement part is provided at a stage subsequent to the membrane-type degassing device and the inert gas dissolving device,
and providing a mechanism to maintain a concentration of the inert gas, comprising a gas flow regulating valve and a control part, wherein the control part is connected to each of the gas concentration measurement part and the gas flow regulating valve, and the mechanism to maintain the concentration of the inert gas always in the vicinity of or more than a saturation solubility of the inert gas and at 15 ppm or more at the stage subsequent to the inert gas dissolving device, so as to maintain a saturated state of the inert gas in the subsequent stage.

### Claim 2 (depends on 1)

The method of providing pH-adjusted water production device according to claim 1, wherein the membrane-type degassing device is configured to inject the inert gas by applying suction.

### Claim 3 (depends on 1)

The method of providing pH-adjusted water production device according to claim 1, further comprising providing a pH measurement part at the stage subsequent to the membrane-type degassing device and the inert gas dissolving device.

### Claim 4 (depends on 1)

The method of providing pH-adjusted water production device according to claim 1, wherein the control part comprises a processor.
