Substrate cleaning device, substrate processing device, and maintenance method for substrate cleaning device

A maintenance method for a substrate cleaning device,

• in which the substrate cleaning device includes
• a roll cleaning member configured to scrub a substrate, and
• a rotation holding portion configured to hold an end portion of the roll cleaning member in an axial direction,
• the rotation holding portion includes
• a shaft portion configured to be connected to the end portion of the roll cleaning member in the axial direction,
• a housing portion configured to surround the shaft portion,
• a bearing portion configured to be disposed inside the housing portion and to rotatably support the shaft portion, and
• a non-contact sealing portion configured to be disposed between the bearing portion and the roll cleaning member to seal a gap between the shaft portion and the housing portion, and
• the non-contact sealing portion includes
• a rotating portion configured to be attached to the shaft portion and to have a plurality of protrusion portions formed on a peripheral surface of the rotating portion at intervals in the axial direction, and
• a fixed portion configured to be attached to the housing portion, to surround the plurality of protrusion portions, and to have a gas supply hole formed in an inner peripheral surface of the fixed portion surrounding the plurality of protrusion portions, the gas supply hole supplying a compressed gas from a position inward of the protrusion portions in the axial direction, which are disposed at both end portions in the axial direction, among the plurality of protrusion portions, the method comprising:
• performing maintenance in a state in which, after the fixed portion is removed from the housing portion, a cover surrounding the rotating portion is attached to a place from which the fixed portion is removed.