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US 12,593,649 B2Granted
Apparatus and method for treating substrate
AssigneeSemes Co., Ltd.
InventorsJun Young Choi, Gui Su Park, Young Jin Jang, Jun Hyun Lim
Life of this patent
Estimating the term…
Abstract
The inventive concept provides a substrate treating apparatus. The substrate treating apparatus includes a treating bath having an accommodation space for accommodating a treating liquid; a support member configured to support at least one substrate in a vertical posture at the accommodation space; and a posture changing robot configured to change a posture of a substrate immersed in the treating liquid from the vertical posture to a horizontal posture, and wherein the posture changing robot comprises: a body configured to hold the substrate thereon; and a liquid supply member configured to supply a wetting liquid to the substrate placed on the body.
Claims20
A substrate treating apparatus comprising:
- a treating bath having an accommodation space for accommodating a treating liquid;
- a support member configured to support at least one substrate in a vertical posture at the accommodation space;
- and
- a posture changing robot configured to change a posture of the substrate immersed in the treating liquid from the vertical posture to a horizontal posture, and
- wherein the posture changing robot comprises:
- a body configured to hold the substrate thereon, the body including
- a joint portion;
- and
- a hand coupled to the joint portion, the hand including a fastening body configured to couple the hand to the joint portion and a support body configured to support the substrate;
- and
- a liquid supply member configured to supply a wetting liquid to the substrate placed on the body, the liquid supply member being aligned with the fastening body and a length direction of the support bady.
8 more elements
A substrate treating apparatus comprising:
- a first process treating unit configured to treat a substrate in a batch-type manner;
- and
- a second process treating unit configured to treat the substrate in a single-type manner, and
- wherein the first process treating unit comprises:
- a posture changing treating bath configured to have an accommodation space for accommodating a liquid;
- a support member configured to support at least one substrate in a vertical posture at the accommodation space;
- and
- a posture changing robot configured to change a posture of a substrate immersed in the liquid from the vertical posture to a horizontal posture, the posture changing robot having
- a body for holding the substrate, the body including
- a joint portion, and
- a hand coupled to the joint portion, the hand including a fastening body configured to couple the hand to the joint portion and a support body configured to support the substrate,
- an arm for changing a position of the body, and
- a liquid supply member for supplying a wetting liquid to the substrate placed on the body, the liquid supply member being aligned with the fastening body and a length direction of the support body.
10 more elements
A substrate treating apparatus comprising:
- a first process treating unit configured to treat a substrate in a batch-type manner;
- a second process treating unit configured to treat the substrate in a single-type manner;
- and
- a controller,
- wherein the first process treating unit comprises:
- a batch-type treating bath configured to treat the substrates in a vertical posture;
- a posture changing treating bath configured to change a posture of the substrate in the vertical posture to a horizontal posture, the posture changing treating bath having an accommodation space for accommodating a liquid and a support member for supporting the substrate at the accommodation space in the vertical posture;
- and
- a posture changing robot configured to change the posture of the substrate immersed in the liquid from the vertical posture to the horizontal posture, the posture changing robot having
- a body for holding the substrate, the body including
- a joint portion;
- and
- a hand coupled to the joint portion, the hand including a fastening body configured to couple the hand to the joint portion and a support body configured to support the substrate,
- an arm for changing a position of the body, and
- a liquid supply member for supplying a wetting liquid to the substrate placed on the body, the liquid supply member being aligned with the fastening body and a length direction of the support body, and
- wherein the second process treating unit comprises:
- a single-type treating chamber configured to treat the substrate in the horizontal posture;
- a buffer unit configured to provide a space for temporarily storing the substrate;
- and
- a transfer robot configured to transfer the substrate between the buffer unit and the single-type treating chamber, and
- wherein the controller is configured to control the posture changing robot so the posture changing robot may complete a posture changing of the substrate and transfer a substrate which posture has been changed to the buffer unit.
18 more elements
Dependencies are inferred from the claim text.