Batch thermal process chamber

A processing chamber, comprising:

• a housing structure having a first side wall and a second side wall opposite the first side wall in a first direction;
• a gas injection assembly coupled to the first side wall;
• a gas exhaust assembly coupled to the second side wall;
• a quartz chamber disposed within the housing structure;
• a process kit disposed within the quartz chamber, the process kit comprising:
• a cassette having a plurality of shelves configured to retain substrates thereon;
• an outer liner comprising an upper outer liner and a lower outer liner;
• an inner liner having:
• a plurality of first inlet openings disposed on an injection side of the inner liner and configured to be in fluid communication with the gas injection assembly;
• and
• a plurality of first outlet openings disposed on an exhaust side of the inner liner and configured to be in fluid communication with the gas exhaust assembly;
• and
• a top plate and a bottom plate attached to an inner surface of the inner liner, the top plate and the bottom plate forming an enclosure together with the inner liner, wherein inner surfaces of the enclosure comprise material configured to cause black-body radiation within the enclosure;
• a plurality of upper lamp modules disposed on a first side of the quartz chamber and configured to provide radiative heat to the process kit;
• a plurality of lower lamp modules disposed on a second side of the quartz chamber opposite the first side in a second direction perpendicular to the first direction and configured to provide radiative heat to the process kit;
• and
• a lift-rotation mechanism configured to move the cassette in the second direction and rotate the cassette about the second direction.

A processing system comprising:

• a processing chamber comprising:
• a housing structure having a first side wall and a second side wall opposite the first side wall in a first direction;
• a gas injection assembly coupled to the first side wall;
• a gas exhaust assembly coupled to the second side wall;
• a quartz chamber disposed within the housing structure;
• a process kit disposed within the quartz chamber, the process kit comprising:
• an enclosure having inner surfaces comprising a material configured to cause black-body radiation within the enclosure;
• a cassette disposed within the enclosure, the cassette having a plurality of shelves configured to retain substrates thereon;
• an outer liner comprising an upper outer liner and a lower outer liner;
• an inner liner having:
• a plurality of first inlet openings disposed on an injection side of the inner liner and configured to be in fluid communication with the gas injection assembly;
• a plurality of first outlet openings disposed on an exhaust side of the inner liner and configured to be in fluid communication with the gas exhaust assembly;
• a slit opening;
• and
• a top plate and a bottom plate attached to an inner surface of the inner liner, the top plate and the bottom plate forming the enclosure together with the inner liner, wherein inner surfaces of the enclosure comprise material configured to cause black-body radiation within the enclosure;
• a plurality of upper lamp modules disposed on a first side of the quartz chamber and configured to provide radiative heat to the substrates;
• a plurality of lower lamp modules disposed on a second side of the quartz chamber opposite the first side in a second direction perpendicular to the first direction and configured to provide radiative heat to the substrates;
• and
• a lift-rotation mechanism configured to move the cassette in the second direction and rotate the cassette about the second direction;
• and
• a transfer robot configured to transfer substrates into and from the process kit disposed in the processing chamber.