Silicon precursor having a heterocyclic group, composition for depositing a silicon-containing layer comprising the same and method of depositing a silicon-containing layer using the same

Abstract

Provided are a silicon precursor having a heterocyclic group, a composition for depositing a silicon-containing layer including the same, and a method of depositing a silicon-containing layer using the same. The silicon precursor is represented by Formula 1. In Formula 1, A1 is a heterocyclic group including one or more nitrogen, and R1 is hydrogen or an alkyl group of 1˜6 carbon atoms. R2 and R3 may be each independently an alkyl group of 1˜6 carbon atoms.

Dependencies are inferred from the claim text.