IGBT and diode with lifetime control regions
AssigneeMitsubishi Electric Corporation
InventorsKosuke Sakaguchi, Takahiro Nakatani, Koichi Nishi, Shinya Soneda
Life of this patent
Estimating the term…
Loading patent…
AssigneeMitsubishi Electric Corporation
InventorsKosuke Sakaguchi, Takahiro Nakatani, Koichi Nishi, Shinya Soneda
Estimating the term…
According to the disclosure, a semiconductor device includes a semiconductor substrate including an IGBT region and a diode region, a first electrode provided on an upper surface of the semiconductor substrate and a second electrode provided on a back surface of the semiconductor substrate, wherein the diode region includes an n-type drift layer, a p-type anode layer provided on an upper surface side of the drift layer, and an n-type cathode layer provided on a back surface side of the drift layer, a lifetime control region having crystal defect density higher than crystal defect density of other portions of the drift layer and including protons is provided on a back surface side relative to a center in a thickness direction of the semiconductor substrate among the drift layer, and a maximum value of donor concentration of the lifetime control region is equal to or less than 1.0×1015/cm3.
A semiconductor device comprising:
A semiconductor device comprising:
Dependencies are inferred from the claim text.