Loading patent…
AssigneeApplied Materials, Inc.
InventorsJennifer Y. Sun, Ren-Guan Duan, Gayatri Natu, Tae Won Kim, Jiyong Huang, Nitin Deepak, Paul Brillhart, Lin Zhang, Yikai Chen, Sanni Sinikka Seppälä, Ganesh Balasubramanian, JuanCarlos Rocha, Shankar Venkataraman, Katherine Elizabeth Woo
Estimating the term…
Embodiments of the disclosure relate to articles, coated chamber components and methods of coating chamber components with a protective coating that includes at least one metal fluoride having a formula selected from the group consisting of M1xFw, M1xM2yFw and M1xM2yM3zFw, where at least one of M1, M2, or M3 is magnesium or lanthanum. The protective coating can be deposited by atomic layer deposition, chemical vapor deposition, electron beam ion assisted deposition, or physical vapor deposition.
A semiconductor chamber component comprising:
Dependencies are inferred from the claim text.