Substrate processing apparatus and substrate processing method

A substrate processing apparatus comprising:

• a first transfer path that is a transfer path for a substrate after MOR film formation and before exposure, and a second transfer path that is a transfer path for the substrate after exposure;
• one or a plurality of nitrogen atmosphere placement stages provided on at least one of the first transfer path and the second transfer path and configured to place the substrate in an environment with a nitrogen concentration of an atmosphere set higher than that of air;
• a tower provided in a block where the substrate is delivered to and from an exposure apparatus and having a plurality of accommodation spaces formed vertically at a plurality of levels;
• and
• one or a plurality of air atmosphere placement stages configured to place the substrate in an air environment,
• wherein at least one of the nitrogen atmosphere placement stages is provided in any of the accommodation spaces in the tower, and
• wherein at least one of the air atmosphere placement stages is provided in any of the accommodation spaces in the tower where the nitrogen atmosphere placement stage is not provided.