Method for adjusting a patterning process
AssigneeASML Netherlands B.V.
InventorsSatej Subhash Khedekar, Henricus Jozef Castelijns, Anjan Prasad Gantapara, Stephen Henry Bond, Seyed Iman Mossavat, Alexander Ypma, Gerald Dicker, Ewout Klaas Steinmeier, Chaoqun Guo, Chenxi Lin, Hongwei Chen, Zhaoze Li, Youping Zhang, Yi Zou, Koos Van Berkel, Joost Johan Bolder, Arnaud Hubaux, Andriy Vasyliovich Hlod, Juan Manuel Gonzalez Huesca, Frans Bernard Aarden
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