Method for obtaining training data for training a model of a semiconductor manufacturing process
AssigneeASML Netherlands B.V.
InventorsRoy Werkman, Lydia Marianna Vergaij-Huizer
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AssigneeASML Netherlands B.V.
InventorsRoy Werkman, Lydia Marianna Vergaij-Huizer
Estimating the term…
A method for obtaining a training data set including synthetic metrology data, the training data set being configured for training of a model relating to a manufacturing process for manufacturing an integrated circuit. The method includes obtaining behavioral property data describing a behavior of a process parameter resultant from the manufacturing process and/or a related tool or effect. Additionally, or alternatively metrology data performed on a structure formed by the manufacturing process and/or a similar manufacturing process may be obtained. Using the behavioral property data and/or metrology data, synthetic metrology data is determined, which describes the effect of variations in the manufacturing process, and/or a related tool or effect on the process parameter. The model is trained using the training data set including the synthetic metrology data.
A method comprising:
A computer program product comprising a non-transitory computer-readable medium comprising program instructions therein, the instructions, upon execution by a computer system, configured to cause the computer system to at least:
Dependencies are inferred from the claim text.