Substrate treating apparatus and substrate treating method
AssigneeSemes Co., Ltd.
InventorsHyun Yoon, Ki Hoon Choi, Hyo Won Yang, Tae Hee Kim, In Ki Jung
Life of this patent
Estimating the term…
Abstract
Disclosed is a substrate treating apparatus including a support unit that supports and rotates a substrate, a heating unit including a laser irradiator that irradiates laser light in a pattern formed in the substrate, a movement module that changes a location of the laser irradiator by moving the heating unit, and a controller that controls the support unit and the heating unit, the movement module moves the heating unit between a heating location, at which the laser light is irradiated to the substrate, and a standby location that deviates from the substrate, and the movement module rotates and linearly moves the heating unit.
Claims10
A substrate treating apparatus comprising:
- a support unit configured to support and rotate a substrate;
- a heating unit housing a camera module and a laser irradiator, the laser irradiator configured to irradiate laser light in a pattern formed in the substrate;
- a movement module configured to change a location of the laser irradiator by moving the heating unit;
- and
- a controller configured to control the support unit and the heating unit,
- wherein the movement module moves the heating unit between a heating location, at which the laser light is irradiated to the substrate, and a standby location that deviates from the substrate,
- wherein the movement module rotates and linearly moves the heating unit,
- wherein the camera module acquires an image when the laser light is irradiated to the substrate,
- wherein the controller adjusts a position of the laser irradiator based on the image acquired by the camera module when the laser light is irradiated to the substrate,
- wherein the substrate has a plurality of cells, the pattern formed in the substrate includes a first pattern and a second pattern, the first pattern is formed in the plurality of cells, and the second pattern is formed on an outer side of the area, in which the plurality of cells are formed,
- wherein the controller controls the movement module to rotate the heating unit to position the laser irradiator at a heating location corresponding to a quadrant of the substrate in which the second pattern is located and to linearly move the heating unit to align the laser irradiator with the second pattern,
- wherein the second pattern is pre-positioned at the heating location such that a maximum stroke of the movement module during linear movement is reduced,
- wherein the laser irradiator irradiates the laser light to, among the first pattern and the second pattern, the second pattern, and
- when the laser irradiator is located within the heating location, a center point of the laser irradiator and a center point of the second pattern coincide with each other.
Dependencies are inferred from the claim text.