Semiconductor processing system, and control assembly and method thereof
AssigneeEnchip Enterprise LLC
InventorJulian Juuchuan Hsieh
Life of this patent
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Abstract
This disclosure relates to a semiconductor processing system, and control assembly and method thereof. The semiconductor processing system includes a mass flow controller (MFC), a control assembly and a process chamber. The MFC is coupled to a gas source to receive an input gas. The control assembly, which is coupled to the MFC, includes a charge chamber, an inlet valve and an outlet valve. The charge chamber is arranged to accommodate the input gas. The inlet valve is arranged to control a charge of the input gas for the charge chamber. The outlet valve is arranged to control a release of the input gas accommodated in the charge chamber. The process chamber is coupled to the outlet valve of the control assembly.
Claims11
A method of controlling a semiconductor processing system including a control assembly coupled between a mass flow controller (MFC) and a process chamber, the method comprising:
- operating in a process stage, comprising:
- providing an input gas from a gas source to a precursor tank via the MFC and a first inlet valve located between the MFC and the precursor tank, the precursor tank coupled between the MFC and the control assembly and providing a precursor vapor in the inlet gas to allow the input gas carrying the precursor vapor;
- activating a second inlet valve of the control assembly coupled between the gas source and a charge chamber of the control assembly to charge the charge chamber with the input gas carrying the precursor vapor;
- and
- activating a first outlet valve of the control assembly coupled between the charge chamber and the process chamber to release the input gas in the charge chamber into the process chamber;
- operating in a transition stage, comprising:
- activating the second inlet valve to charge the charge chamber with the input gas carrying the precursor vapor;
- and
- activating a second outlet valve of the control assembly coupled between the charge chamber and a dump line;
- and
- operating in an offline purging stage, comprising:
- deactivating the first inlet valve and activating the second inlet valve and the second outlet valve of the control assembly to clean a gas line coupled between the gas source and the charge chamber by using the input gas.
Dependencies are inferred from the claim text.