Canister, precursor transfer system having the same and method for measuring precursor remaining amount thereof
AssigneeSamsung Electronics Co., Ltd.
InventorsKyungrim Kim, Dowon Kim, Sunja Kim, Youngeun Kim
Life of this patent
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Abstract
A canister supplying a precursor to a processing chamber includes a body, a first valve introducing a carrier gas into the body, a second valve discharging a sublimated gas of a solid precursor into a processing chamber, a precursor accommodating tray accommodating the solid precursor, and at least one piezoelectric transducer at least one of vibrating the precursor accommodating tray or measuring a resonance frequency.
Claims20
A method of forming a precursor transfer system, the method comprising:
- providing a processing chamber;
- and
- forming a canister configured to supply a sublimated gas of a solid precursor to the processing chamber,
- wherein the precursor transfer system comprises:
- a carrier gas supply device configured to discharge a carrier gas;
- the canister configured to receive the carrier gas through a first pipe and to discharge a mixed gas comprising the sublimated gas of the solid precursor through a second pipe;
- a reaction gas supply device configured to discharge at least one reaction gas through a third pipe;
- and
- the processing chamber configured to provide the mixed gas and the at least one reaction gas to a substrate on a chuck,
- wherein the canister comprises:
- a body;
- a first valve configured to introduce the carrier gas into the body;
- a second valve configured to discharge the sublimated gas of the solid precursor into the processing chamber;
- a precursor accommodating tray configured to accommodate the solid precursor;
- and
- at least one piezoelectric transducer configured to at least one of vibrate the precursor accommodating tray or measure a resonance frequency of the canister.
A method of forming a precursor transfer system, the method comprising:
- providing a processing chamber;
- and
- forming a canister configured to supply a sublimated gas of a solid precursor to the processing chamber,
- wherein the precursor transfer system comprises:
- a carrier gas supply device configured to discharge a carrier gas;
- the canister configured to receive the carrier gas through a first pipe and to discharge a mixed gas comprising the sublimated gas of the solid precursor through a second pipe;
- a reaction gas supply device configured to discharge at least one reaction gas through a third pipe;
- and
- the processing chamber configured to provide the mixed gas and the at least one reaction gas to a substrate on a chuck, and
- wherein the canister comprises a piezoelectric transducer configured to vibrate a precursor accommodating tray to accommodate the solid precursor or measure a resonance frequency of the canister.
A method of operating a precursor transfer system configured to accommodate a solid precursor, the method comprising:
- detecting a resonance frequency of a canister using a piezoelectric transducer;
- and
- calculating a remaining amount of the solid precursor based at least in part on the detected resonance frequency,
- wherein the piezoelectric transducer is configured to vibrate a precursor accommodating tray or measure the resonance frequency of the canister.
Dependencies are inferred from the claim text.